(19)
(11) EP 1 332 406 A2

(12)

(88) Date of publication A3:
21.11.2002

(43) Date of publication:
06.08.2003 Bulletin 2003/32

(21) Application number: 01990140.4

(22) Date of filing: 31.10.2001
(51) International Patent Classification (IPC)7G03F 7/004
(86) International application number:
PCT/US0148/006
(87) International publication number:
WO 0203/9186 (16.05.2002 Gazette 2002/20)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 09.11.2000 US 247393 P

(71) Applicant: E. I. du Pont de Nemours and Company
Wilmington,Delaware 19898 (US)

(72) Inventors:
  • PETROV, Viacheslav Alexandrovich
    Hockessin, DE 19707 (US)
  • SCHADT, III, Frank, L.
    Wilmington, DE 19806 (US)

(74) Representative: Butler, Michael John 
Frank B. Dehn & Co.,European Patent Attorneys,179 Queen Victoria Street
London EC4V 4EL
London EC4V 4EL (GB)

   


(54) PHOTOACID GENERATORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY