(19)
(11) EP 1 354 245 A2

(12)

(88) Date of publication A3:
14.08.2003

(43) Date of publication:
22.10.2003 Bulletin 2003/43

(21) Application number: 01987101.1

(22) Date of filing: 26.11.2001
(51) International Patent Classification (IPC)7: G03F 7/039
(86) International application number:
PCT/US0144/295
(87) International publication number:
WO 0204/4815 (06.06.2002 Gazette 2002/23)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 29.11.2000 US 253822 P

(71) Applicant: E. I. du Pont de Nemours and Company
Wilmington,Delaware 19898 (US)

(72) Inventors:
  • BERGER, Larry, L
    Chadds Ford, PA 19317 (US)
  • SCHADT, Frank, L., III
    Wilmington, DE 19806 (US)

(74) Representative: Towler, Philip Dean 
Frank B. Dehn & Co.,European Patent Attorneys,179 Queen Victoria Street
London EC4V 4EL
London EC4V 4EL (GB)

   


(54) MULTILAYER ELEMENTS CONTAINING PHOTORESIST COMPOSITIONS AND THEIR USE IN MICROLITHOGRAPHY