(19)
(11) EP 1 357 426 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
23.11.2005 Bulletin 2005/47

(43) Date of publication A2:
29.10.2003 Bulletin 2003/44

(21) Application number: 02256555.0

(22) Date of filing: 20.09.2002
(51) International Patent Classification (IPC)7: G03F 1/14, G03F 7/20
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 23.04.2002 JP 2002160741
07.06.2002 JP 2002167769

(71) Applicant: CANON KABUSHIKI KAISHA
Tokyo (JP)

(72) Inventors:
  • Yamazoe, Kenji
    Tochigi (JP)
  • Saitoh, Kenji
    Utsunomiya, Tochigi (JP)
  • Suzuki, Akiyoshi
    Tokyo (JP)

(74) Representative: Beresford, Keith Denis Lewis et al
BERESFORD & Co. 16 High Holborn
London WC1V 6BX
London WC1V 6BX (GB)

   


(54) Method for setting mask pattern and its illumination condition


(57) A method for setting a mask pattern and an illumination condition suitable for an exposure method for using plural kinds of light to illuminate a mask that arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern, so as to resolve the predetermined pattern without resolving the auxiliary pattern on a target via a projection optical system includes the steps of forming data for the predetermined pattern, forming data for the auxiliary pattern, and setting the illumination condition for defining an effective light source of illumination using the plural kinds of light.






Search report