ALTERNATING PHASE SHIFT MASKING FOR MULTIPLE LEVELS OF MASKING RESOLUTION - Patent 1370909

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EP 1 370 909 A1

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(43)	Date of publication:
	17.12.2003 Bulletin 2003/51

(21)	Application number: 01914759.4

(22)	Date of filing: 08.03.2001

(51)	International Patent Classification (IPC)⁷: G03F 1/00

(86)	International application number:
	PCT/US0107/413

(87)	International publication number:
	WO 0207/3312 (19.09.2002 Gazette 2002/38)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
	Designated Extension States:
	AL LT LV MK RO SI

(71)	Applicant: Numerical Technologies Inc.
	Mountain View,California 94043 (US)

(72)	Inventor:
	WU, Shao-Po Portola Valley, CA 94028 (US)

(74)	Representative: Haines, Miles John
	D. Young & Co.21 New Fetter Lane London EC4A 1DA London EC4A 1DA (GB)

(54)	ALTERNATING PHASE SHIFT MASKING FOR MULTIPLE LEVELS OF MASKING RESOLUTION