(19)
(11) EP 1 373 151 A1

(12)

(43) Date of publication:
02.01.2004 Bulletin 2004/01

(21) Application number: 02714956.6

(22) Date of filing: 11.02.2002
(51) International Patent Classification (IPC)7C03B 32/00, C03C 23/00
(86) International application number:
PCT/US2002/005237
(87) International publication number:
WO 2002/068350 (06.09.2002 Gazette 2002/36)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 24.02.2001 US 271135 P
28.11.2001 US 997782

(71) Applicant: CORNING INCORPORATED
Corning, N.Y. 14831 (US)

(72) Inventors:
  • MOORE, Lisa A.,
    Corning, NY 14830 (US)
  • SMITH, Charlene, M.,
    Corning, NY 14830 (US)

(74) Representative: Poole, Michael John et al
Corning LimitedPatents & Licensing DepartmentQuantum House,Maylands Avenue
Hemel Hempstead, Herts. HP2 7DE
Hemel Hempstead, Herts. HP2 7DE (GB)

   


(54) OXYGEN DOPING OF SILICON OXYFLUORIDE GLASS