PHOTORESIST COMPOSITIONS COMPRISING SOLVENTS FOR SHORT WAVELENGTH IMAGING - Patent 1377879

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EP 1 377 879 A2

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(88)	Date of publication A3:
	15.05.2003

(43)	Date of publication:
	07.01.2004 Bulletin 2004/02

(21)	Application number: 02726647.7

(22)	Date of filing: 15.03.2002

(51)	International Patent Classification (IPC)⁷: G03F 7/004, G03F 7/039

(86)	International application number:
	PCT/US2002/008127

(87)	International publication number:
	WO 2002/084401 (24.10.2002 Gazette 2002/43)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
	Designated Extension States:
	AL LT LV MK RO SI

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Priority:

22.03.2001 US 278170 P

(71)	Applicant: Shipley Company LLC
	Marlborough, MA 01752 (US)

(72)	Inventors:
	SZMANDA, Charles, R. Westborough, MA 01581 (US) ZAMPINI, Anthony Westborough, MA 01581 (US)

(74)	Representative: Kent, Venetia Katherine
	Rohm and Haas (UK) Ltd.,28th Floor,City Point,One Ropemaker Street London EC2Y 9HS London EC2Y 9HS (GB)

(54)	PHOTORESIST COMPOSITIONS COMPRISING SOLVENTS FOR SHORT WAVELENGTH IMAGING