Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)

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EP 1 383 359 A3

(12)	EUROPEAN PATENT APPLICATION

(88)	Date of publication A3:
	13.08.2008 Bulletin 2008/33

(43)	Date of publication A2:
	21.01.2004 Bulletin 2004/04

(21)	Application number: 03077226.3

(22)	Date of filing: 17.07.2003

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International Patent Classification (IPC):

H05H 1/24^(2006.01)

H01J 37/32^(2006.01)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
	Designated Extension States:
	AL LT LV MK

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Priority:

19.07.2002 US 198740

(71)	Applicant: FUJIFILM Manufacturing Europe B.V.
	5047 TK Tilburg (NL)

(72)	Inventors:
	van de Sanden, Mauritius Cornelius Maria 5017 JC Tilburg (NL) Aldea, Eugen 5616 GK Tilburg (NL) Mori, Fuyuhiko 5045 SH Tilburg (NL) de Vries, Hindrik Willem 5045 CM Tilburg (NL)

(74)	Representative: Valkonet, Rutger et al
	Algemeen Octrooi- en Merkenbureau P.O. Box 645 5600 AP Eindhoven 5600 AP Eindhoven (NL)

(54)	Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)

(57) Method and arrangement for generating an atmospheric pressure glow (APG) plasma (1), wherein the plasma (1) is generated in a discharge space (10) between a plurality of electrodes (3, 4). A dielectric (2) is present on at least one of the electrodes (4), which dielectric (2) has a boundary surface with the plasma (1) enabling interactions between the plasma (1) and the boundary surface of the dielectric (2). The dielectric (2) is arranged for releasing electrons contributing to the plasma (1) from the boundary surface by the interactions.

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