(19)
(11) EP 1 384 257 A2

(12)

(88) Date of publication A3:
27.02.2003

(43) Date of publication:
28.01.2004 Bulletin 2004/05

(21) Application number: 02734191.6

(22) Date of filing: 03.05.2002
(51) International Patent Classification (IPC)7: H01L 21/768, H01L 21/285
(86) International application number:
PCT/US2002/014145
(87) International publication number:
WO 2002/091461 (14.11.2002 Gazette 2002/46)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 04.05.2001 US 288952 P

(71) Applicant: Tokyo Electron Limited
Minato-ku,Tokyo 107 (JP)

(72) Inventors:
  • YASAR, Tugrul
    Scottsdale, AZ 85259 (US)
  • REYNOLDS, Glyn
    Las Vegas, NV 89113 (US)
  • CERIO, Frank
    Phoenix, AZ 85045 (US)
  • GITTLEMAN, Bruce
    Scottsdale, AZ 85260 (US)
  • GRAPPERHAUS, Michael
    Lowell, MA 01851 (US)
  • ROBISON, Rodney
    Mesa, AZ 85212 (US)

(74) Representative: Findlay, Alice Rosemary 
Lloyd WiseCommonwealth House,1-19 New Oxford Street
London WC1A 1LW
London WC1A 1LW (GB)

   


(54) IONIZED PVD WITH SEQUENTIAL DEPOSITION AND ETCHING