ION-BEAM DEPOSITION PROCESS FOR MANUFACTURING BINARY PHOTOMASK BLANKS - Patent 1386198

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EP 1 386 198 A2

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(88)	Date of publication A3:
	12.09.2003

(43)	Date of publication:
	04.02.2004 Bulletin 2004/06

(21)	Application number: 02721791.8

(22)	Date of filing: 19.04.2002

(51)	International Patent Classification (IPC)⁷: G03F 1/08, C03C 17/34

(86)	International application number:
	PCT/US2002/012542

(87)	International publication number:
	WO 2002/086622 (31.10.2002 Gazette 2002/44)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
	Designated Extension States:
	AL LT LV MK RO SI

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Priority:

19.04.2001 US 284831 P

(71)	Applicants:
	E.I. du Pont de Nemours and Company Wilmington, DE 19898 (US) Carcia, Peter Francis Wilmington, DE 19810 (US) Dieu, Laurent Austin, TX 78729 (US)

(72)	Inventors:
	CARCIA, Peter, Francis Wilmington, DE 19810 (US) DIEU, Laurent Austin, TX 78729 (US)

(74)	Representative: Cockerton, Bruce Roger
	Carpmaels & Ransford,43 Bloomsbury Square London WC1A 2RA London WC1A 2RA (GB)

(54)	ION-BEAM DEPOSITION PROCESS FOR MANUFACTURING BINARY PHOTOMASK BLANKS