(19)
(11) EP 1 387 898 A1

(12)

(43) Date of publication:
11.02.2004 Bulletin 2004/07

(21) Application number: 01919965.2

(22) Date of filing: 16.04.2001
(51) International Patent Classification (IPC)7: C23C 16/18, C07C 49/92, C07F 1/08
(86) International application number:
PCT/JP2001/003257
(87) International publication number:
WO 2002/086189 (31.10.2002 Gazette 2002/44)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

(71) Applicant: Sharp Kabushiki Kaisha
Osaka-shiOsaka (JP)

(72) Inventors:
  • ZHUANG, Wei-Wei
    Vancouver, WA 98683 (US)
  • NGUYEN, Tue
    Fremont, CA 94539 (US)
  • CHARNESKI, Lawrence, J.
    Vancouver, WA 98682 (US)
  • EVANS, David, R.
    Beaverton, OR 97007 (US)
  • HSU, Sheng, Teng
    Camas, WA 98607 (US)

(74) Representative: Müller, Frithjof E., Dipl.-Ing. 
Müller Hoffmann & PartnerPatentanwälteInnere Wiener Strasse 17
81667 München
81667 München (DE)

   


(54) SUBSTITUTED CYCLOALKENE NEW COPPER PRECURSORS FOR CHEMICAL VAPOR DEPOSITION OF COPPER METAL THIN FILMS