(19)
(11) EP 1 403 714 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
10.01.2007 Bulletin 2007/02

(43) Date of publication A2:
31.03.2004 Bulletin 2004/14

(21) Application number: 03256068.2

(22) Date of filing: 26.09.2003
(51) International Patent Classification (IPC): 
G03F 7/20(2006.01)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
Designated Extension States:
AL LT LV MK

(30) Priority: 30.09.2002 EP 02256794

(71) Applicant: ASML Netherlands B.V.
5504 DR Veldhoven (NL)

(72) Inventors:
  • van der Laan, Hans
    5501 CL Veldhoven (NL)
  • Baselmans, Johannes Jacobus Matheus
    5688 GG Oirschot (NL)
  • van Dijsseldonk, Antonius Johannes Josephus
    5527 BH Hapert (NL)
  • Leenders, Martinus Hendrikus Antonius
    3039 ER Rotterdam (NL)
  • Moors, Johannes Hubertus Josephina
    5709 MT Helmond (NL)

(74) Representative: Leeming, John Gerard 
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5JJ
London WC1R 5JJ (GB)

   


(54) Lithographic apparatus and a measurement system


(57) A lithographic projection apparatus comprising:
- a radiation system for providing a projection beam of radiation;
- a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern;
- a substrate table for holding a substrate;
- a projection system for projecting the patterned beam onto a target portion of the substrate, and
- a measurement system for measuring wave front aberrations of the projection system,
characterized in that:
- said measurement system comprises: a diffractive element and structure for increasing the pupil filling of the radiation in the pupil of the projection system, both movable into the projection beam between the radiation system and the projection system; and a sensor module for sensing radiation that has traversed the projection system for measuring wave front aberrations of the projection system.






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