(19)
(11) EP 1 404 463 A2

(12)

(88) Date of publication A3:
27.02.2003

(43) Date of publication:
07.04.2004 Bulletin 2004/15

(21) Application number: 02749953.2

(22) Date of filing: 09.07.2002
(51) International Patent Classification (IPC)7: B08B 3/02
(86) International application number:
PCT/US2002/021997
(87) International publication number:
WO 2003/006183 (23.01.2003 Gazette 2003/04)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 12.07.2001 US 905030
26.03.2002 US 108278

(71) Applicants:
  • SEMITOOL, INC.
    Kalispell,Montana 59901 (US)
  • Bexten, Daniel P.
    Kalispell, MT 59901 (US)
  • Bryer, James
    Kalispell, MT 59901 (US)
  • Norby, Jerry R.
    Kalispell, MT Montana 59901 (US)

(72) Inventors:
  • BEXTEN, Daniel, P.
    Kalispell, MT 59901 (US)
  • BRYER, James
    Kalispell, MT 59901 (US)
  • NORBY, Jerry, R.
    Kalispell, Mt Montana 59901 (US)

(74) Representative: Viering, Hans-Martin, Dipl.-Ing. 
PatentanwälteViering, Jentschura & Partner,Postfach 22 14 43
80504 München
80504 München (DE)

   


(54) METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS AND OTHER FLAT MEDIA