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<ep-patent-document id="EP1404722A1" country="EP" dtd-version="ep-patent-document-v1-4.dtd" doc-number="1404722" date-publ="20040407" file="01938762.0" lang="en" kind="A1" status="n"><SDOBI lang="en"><B000><eptags><B001EP>ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIROMKCYALTR............................</B001EP><B003EP>*</B003EP><B005EP>X</B005EP><B007EP>DIM350 (Ver 2.1 Jan 2001) 1100000/0 1710000/0</B007EP></eptags></B000><B100><B110>1404722</B110><B130>A1</B130><B140><date>20040407</date></B140><B190>EP</B190></B100><B200><B210>01938762.0</B210><B220><date>20010530</date></B220><B240><B241><date>20030115</date></B241></B240><B250>En</B250><B251EP>En</B251EP><B260>En</B260></B200><B400><B405><date>20040407</date><bnum>200415</bnum></B405><B430><date>20040407</date><bnum>200415</bnum></B430></B400><B500><B510><B516>7</B516><B511> 7C 08F   2/52   A</B511><B512> 7H 01J  37/32   B</B512></B510><B540><B541>de</B541><B542>KONTINUIERLICHE PROZESSAPPARATUR DURCH PLASMAPOLYMERISATION MIT VERTIKALER KAMMER</B542><B541>en</B541><B542>CONTINUOUS PROCESSING APPARATUS BY PLASMA POLYMERIZATION WITH VERTICAL CHAMBER</B542><B541>fr</B541><B542>DISPOSITIF DE TRAITEMENT CONTINU PAR POLYMERISATION PLASMA COMPORTANT UNE CHAMBRE VERTICALE</B542></B540></B500><B700><B710><B711><snm>LG ELECTRONICS INC.</snm><iid>01914274</iid><irf>SC/dl 030005EP</irf><adr><str>20, Yoido-Dong,Youngdungpo-ku</str><city>Seoul 150-721</city><ctry>KR</ctry></adr></B711></B710><B720><B721><snm>HA, Sam-Chul</snm><adr><str>Lotte Apt. 13-201,Yongho-Dong</str><city>Changwon,Kyungsangnam-Do 641-041</city><ctry>KR</ctry></adr></B721><B721><snm>JEONG, Young-Man</snm><adr><str>Hanil Apt. 101-1402,An-Dong</str><city>Kimhae,Kyungsangnam-Do 621-200</city><ctry>KR</ctry></adr></B721><B721><snm>YOUN, Dong-Sik</snm><adr><str>54-1, Banji-Dong</str><city>Changwon,Kyungsangnam-Do 641-170</city><ctry>KR</ctry></adr></B721><B721><snm>JO, Seak-Je</snm><adr><str>Lucky Apt. 15-1001,Banlim-Dong</str><city>Changwon,Kyungsangnam-Do 641-180</city><ctry>KR</ctry></adr></B721></B720><B740><B741><snm>Schippan, Ralph, Dr.-Ing.</snm><iid>00070033</iid><adr><str>COHAUSZ &amp; FLORACKPatent- und RechtsanwälteBleichstrasse 14</str><city>40211 Düsseldorf</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>AT</ctry><ctry>BE</ctry><ctry>CH</ctry><ctry>CY</ctry><ctry>DE</ctry><ctry>DK</ctry><ctry>ES</ctry><ctry>FI</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>GR</ctry><ctry>IE</ctry><ctry>IT</ctry><ctry>LI</ctry><ctry>LU</ctry><ctry>MC</ctry><ctry>NL</ctry><ctry>PT</ctry><ctry>SE</ctry><ctry>TR</ctry></B840><B844EP><B845EP><ctry>AL</ctry></B845EP><B845EP><ctry>LT</ctry></B845EP><B845EP><ctry>LV</ctry></B845EP><B845EP><ctry>MK</ctry></B845EP><B845EP><ctry>RO</ctry></B845EP><B845EP><ctry>SI</ctry></B845EP></B844EP><B860><B861><dnum><anum>KR2001000907</anum></dnum><date>20010530</date></B861><B862>En</B862></B860><B870><B871><dnum><pnum>WO2002096956</pnum></dnum><date>20021205</date><bnum>200249</bnum></B871></B870></B800></SDOBI></ep-patent-document>
