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<SDOBI lang="en"><B000><eptags><B001EP>......DE............................................................................................</B001EP><B005EP>J</B005EP><B007EP>JDIM360 Ver 1.28 (29 Oct 2014) -  2999001/0</B007EP></eptags></B000><B100><B110>1416540</B110><B120><B121>CORRECTED EUROPEAN PATENT SPECIFICATION</B121></B120><B130>B8</B130><B132EP>B1</B132EP><B140><date>20161207</date></B140><B150><B151>W1</B151><B153>73</B153><B155><B1551>de</B1551><B1552>Bibliographie</B1552><B1551>en</B1551><B1552>Bibliography</B1552><B1551>fr</B1551><B1552>Bibliographie</B1552></B155></B150><B190>EP</B190></B100><B200><B210>02749325.3</B210><B220><date>20020722</date></B220><B240><B241><date>20040224</date></B241><B242><date>20090717</date></B242></B240><B250>ja</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>2001227203</B310><B320><date>20010727</date></B320><B330><ctry>JP</ctry></B330><B310>2001228870</B310><B320><date>20010730</date></B320><B330><ctry>JP</ctry></B330></B300><B400><B405><date>20161207</date><bnum>201649</bnum></B405><B430><date>20040506</date><bnum>200419</bnum></B430><B450><date>20160907</date><bnum>201636</bnum></B450><B452EP><date>20160219</date></B452EP><B480><date>20161207</date><bnum>201649</bnum></B480></B400><B500><B510EP><classification-ipcr sequence="1"><text>H01L  27/115       20060101AFI20160208BHEP        </text></classification-ipcr><classification-ipcr sequence="2"><text>G11C  16/04        20060101ALN20160208BHEP        </text></classification-ipcr><classification-ipcr sequence="3"><text>H01L  29/423       20060101ALN20160208BHEP        </text></classification-ipcr><classification-ipcr sequence="4"><text>H01L  29/792       20060101ALN20160208BHEP        </text></classification-ipcr><classification-ipcr sequence="5"><text>H01L  29/788       20060101ALN20160208BHEP        </text></classification-ipcr></B510EP><B540><B541>de</B541><B542>HALBLEITERFESTWERTSPEICHER-BAUELEMENT</B542><B541>en</B541><B542>SEMICONDUCTOR NONVOLATILE MEMORY DEVICE</B542><B541>fr</B541><B542>DISPOSITIF SEMI-CONDUCTEUR DE MÉMOIRE NON VOLATILE</B542></B540><B560><B561><text>JP-A- 1 133 364</text></B561><B561><text>JP-A- 3 228 377</text></B561><B561><text>JP-A- 5 082 798</text></B561><B561><text>JP-A- 6 181 319</text></B561><B561><text>JP-A- 9 326 487</text></B561><B561><text>JP-A- 10 022 404</text></B561><B561><text>JP-A- 11 177 047</text></B561><B561><text>JP-A- 11 220 044</text></B561><B561><text>JP-A- 56 135 973</text></B561><B561><text>JP-A- 61 131 484</text></B561><B561><text>JP-A- 61 172 375</text></B561><B561><text>JP-A- 2001 015 613</text></B561><B561><text>JP-A- 2001 044 395</text></B561><B561><text>US-A- 5 357 134</text></B561><B561><text>US-A- 5 691 939</text></B561><B561><text>US-A- 5 703 388</text></B561><B561><text>US-A- 5 991 204</text></B561><B561><text>US-A1- 2001 000 625</text></B561><B561><text>US-B1- 6 255 166</text></B561><B561><text>US-B1- 6 316 317</text></B561><B562><text>LUO T.Y. ET AL.: 'Effect of H2 content on reliability of ultrathin in-situ steam generated(ISSG) SiO2' IEEE ELECTRON DEVICE LETTERS vol. 21, no. 9, September 2000, pages 430 - 432, XP002965860</text></B562><B565EP><date>20081013</date></B565EP></B560></B500><B600><B620EP><parent><cdoc><dnum><anum>16001382.7</anum><pnum>3101694</pnum></dnum><date>20160620</date></cdoc></parent></B620EP></B600><B700><B720><B721><snm>TANAKA, Toshihiro
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