(19)
(11) EP 1 425 776 A1

(12)

(43) Date of publication:
09.06.2004 Bulletin 2004/24

(21) Application number: 01973705.5

(22) Date of filing: 06.09.2001
(51) International Patent Classification (IPC)7H01J 37/28
(86) International application number:
PCT/US2001/042076
(87) International publication number:
WO 2003/034462 (24.04.2003 Gazette 2003/17)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI

(71) Applicant: Applied Materials, Inc.
Santa Clara,California 95052 (US)

(72) Inventors:
  • MANKOS, Marian
    San Francisco, CA 94115 (US)
  • CHANG, Tai-Hon, Philip
    Milpitas, CA 94404 (US)
  • LEE, Kim, Y.
    Fremont, CA 94536 (US)
  • YU, Ming
    Fremont, CA 94539 (US)

(74) Representative: Bayliss, Geoffrey Cyril et al
BOULT WADE TENNANT,Verulam Gardens70 Gray's Inn Road
London WC1X 8BT
London WC1X 8BT (GB)

   


(54) SUPPRESSION OF EMISSION NOISE FOR MICROCOLUMN APPLICATIONS IN ELECTRON BEAM INSPECTION