(19)
(11) EP 1 451 387 A1

(12)

(43) Date of publication:
01.09.2004 Bulletin 2004/36

(21) Application number: 02789987.1

(22) Date of filing: 04.12.2002
(51) International Patent Classification (IPC)7C23C 16/455
(86) International application number:
PCT/US2002/038565
(87) International publication number:
WO 2003/048414 (12.06.2003 Gazette 2003/24)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SI SK TR
Designated Extension States:
AL LT LV MK RO

(30) Priority: 04.12.2001 US 337639 P
06.08.2002 US 214272

(71) Applicant: Primaxx, Inc.
Allentown, PA 18106 (US)

(72) Inventors:
  • GRANT, Robert, W.
    Hershey, PA 17033 (US)
  • PETRONE, Benjamin, J.
    Mt. Bethel, PA 18343 (US)
  • BRUBAKER, Matthew, D.
    Colorado Springs, CO 80903 (US)
  • MUMBAUER, Paul, D.
    Mohrsville, PA 19541 (US)

(74) Representative: Tönhardt, Marion, Dr. 
Forrester & Boehmert,Pettenkoferstrasse 20-22
80336 München
80336 München (DE)

   


(54) CHEMICAL VAPOR DEPOSITION REACTOR