(19)
(11) EP 1 458 904 A1

(12)

(43) Date of publication:
22.09.2004 Bulletin 2004/39

(21) Application number: 02756489.7

(22) Date of filing: 16.07.2002
(51) International Patent Classification (IPC)7C23C 16/455, C23C 16/14
(86) International application number:
PCT/US2002/022486
(87) International publication number:
WO 2003/064724 (07.08.2003 Gazette 2003/32)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR

(30) Priority: 17.12.2001 US 23125
12.07.2002 US 194442
12.07.2002 US 194629

(71) Applicant: Applied Materials, Inc.
Santa Clara,California 95054 (US)

(72) Inventors:
  • YOO, Jong, Hyun
    Milpitas, CA 95035 (US)
  • LU, Xinliang
    Sunnyvale, CA 94086 (US)
  • CHEN, Chiliang
    Sunnyvale, CA 94538 (US)
  • LAI, Ken, K.
    Milpitas, CA 95035 (US)
  • KAO, Chien-Teh
    Sunnyvale, CA 94086 (US)

(74) Representative: Bayliss, Geoffrey Cyril et al
BOULT WADE TENNANT,Verulam Gardens70 Gray's Inn Road
London WC1X 8BT
London WC1X 8BT (GB)

   


(54) PROCESS FOR TUNGSTEN DEPOSITION BY PULSED GAS FLOW CVD