CHEMICAL PROCESSING USING NON-THERMAL DISCHARGE PLASMA - Patent 1472179

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EP 1 472 179 A2

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(88)	Date of publication A3:
	04.03.2004

(43)	Date of publication:
	03.11.2004 Bulletin 2004/45

(21)	Application number: 02802757.1

(22)	Date of filing: 02.08.2002

(51)	International Patent Classification (IPC)⁷: C01B 3/24, C10G 27/04, C10G 32/02, C10G 35/16

(86)	International application number:
	PCT/US2002/024477

(87)	International publication number:
	WO 2003/040027 (15.05.2003 Gazette 2003/20)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR
	Designated Extension States:
	AL LT LV MK RO SI

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Priority:

02.08.2001 US 309530 P
19.02.2002 US 358340 P

(71)	Applicant: Plasmasol Corporation
	Wall Township, NJ 07753 (US)

(72)	Inventors:
	RICATTO, Pascal Ridgewood, NJ 07450 (US) HOUSTON, Edward East Brunswick, NJ 08816 (US) CROWE, Richard Hazlet, NJ 07730 (US)

(74)	Representative: Held, Stephan, Dr.rer.nat., Dipl.-Chem. et al
	Meissner, Bolte & PartnerPostfach 86 03 29 81630 München 81630 München (DE)

(54)	CHEMICAL PROCESSING USING NON-THERMAL DISCHARGE PLASMA