(19)
(11) EP 1 475 463 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
12.04.2006 Bulletin 2006/15

(43) Date of publication A2:
10.11.2004 Bulletin 2004/46

(21) Application number: 03258024.3

(22) Date of filing: 18.12.2003
(51) International Patent Classification (IPC): 
C25D 3/02(2006.01)
C25D 5/18(2006.01)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
Designated Extension States:
AL LT LV MK

(30) Priority: 20.12.2002 US 435976 P

(71) Applicant: Shipley Company, L.L.C.
Marlborough, MA 01752 (US)

(72) Inventors:
  • Barstad, Leon R.
    Raynharm, Massachusetts 02767 (US)
  • Buckley, Thomas
    Dedham, Massachusetts 02026 (US)
  • Cruz, Raymond
    Watertown, Massachusetts 02472 (US)
  • Goodrick, Trevor
    Windsor, Massachusetts 01270 (US)
  • Hamm, Gary
    Medford, Massachusetts 02155 (US)
  • Kapeckas, Mark J.
    Marlborough, Massachusetts 01752 (US)
  • Price, Katie
    Stoneham, Massachusetts 02120 (US)
  • Reddington, Erik
    Ashland, Massachusetts 01721 (US)
  • Sonnenberg, Wade
    Edgartown, Massachusetts 02539 (US)

(74) Representative: Kent, Venetia Katherine et al
Rohm and Haas (UK) Ltd., European Patent Department, 28th Floor, City Point, One Ropemaker Street
London EC2Y 9HS
London EC2Y 9HS (GB)

   


(54) Reverse pulse plating composition and method


(57) A composition and method for electroplating a metal on a substrate. The composition has a chloride to brightener concentration ratio of from 20:1 to 125:1. The method of electroplating, which employs the composition, employs pulse patterns that improve physical properties of metal surfaces.





Search report