(19)
(11) EP 1 494 072 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
27.12.2006 Bulletin 2006/52

(43) Date of publication A2:
05.01.2005 Bulletin 2005/01

(21) Application number: 04014848.8

(22) Date of filing: 24.06.2004
(51) International Patent Classification (IPC): 
G03F 7/00(2006.01)
G03F 7/075(2006.01)
G02B 1/08(2006.01)
G02B 6/124(2006.01)
 G03F 7/004(2006.01)
G03F 7/038(2006.01)
G02B 6/122(2006.01)
G02B 1/04(2006.01)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL HR LT LV MK

(30) Priority: 25.06.2003 JP 2003180855

(71) Applicant: JSR Corporation
Tokyo 104-0045 (JP)

(72) Inventors:
  • Hanamura, Masaaki
    Tokyo 104-0045 (JP)
  • Nishikawa, Michinori
    Tokyo 104-0045 (JP)
  • Kumano, Atsushi
    Tokyo 104-0045 (JP)

(74) Representative: TBK-Patent 
Bavariaring 4-6
80336 München
80336 München (DE)

   


(54) Radiation sensitive refractive index changing composition, pattern forming method and optical material


(57) There is provided a radiation sensitive refractive index changing composition containing an inorganic oxide particle, a polymerizable compound, a radiation sensitive decomposer and an escapable compound. The radiation sensitive decomposer decomposes upon exposure to radiation to form an acid, base or radical, and this decomposed product increases the molecular weight of the polymerizable compound.





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