TARGETS WITH HIGH PASS-THROUGH-FLUX FOR MAGNETIC MATERIAL SPUTTERING, METHOD OF MANUFACTURE AND HARD DISK OBTAINABLE THEREOF - Patent 1511878

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EP 1 511 878 A2

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(88)	Date of publication A3:
	10.06.2004

(43)	Date of publication:
	09.03.2005 Bulletin 2005/10

(21)	Application number: 03757262.5

(22)	Date of filing: 14.05.2003

(51)	International Patent Classification (IPC)⁷: C23C 14/34, C23C 14/35, H01J 37/34, G11B 5/84, G11B 5/64

(86)	International application number:
	PCT/US2003/015183

(87)	International publication number:
	WO 2003/104521 (18.12.2003 Gazette 2003/51)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
	Designated Extension States:
	AL LT LV MK

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Priority:

07.06.2002 US 163620

(71)	Applicant: Heraeus, Inc.
	Chandler, AZ 85226 (US)

(72)	Inventors:
	ZHANG, Wenjun Tucson, AZ 85716 (US) KUNKEL, Bernd Phoenix, AZ 85048 (US) DEODUTT, Anand Gilbert, AZ 85233 (US) BARTHOLOMEUCZ, Michael Phoenix, AZ 85048 (US)

(74)	Representative: Hill, Justin John
	McDermott, Will & Emery,7 Bishopsgate London EC2N 3AR London EC2N 3AR (GB)

(54)	TARGETS WITH HIGH PASS-THROUGH-FLUX FOR MAGNETIC MATERIAL SPUTTERING, METHOD OF MANUFACTURE AND HARD DISK OBTAINABLE THEREOF