METHOD AND APPARATUS FOR PLASMA IMPLANTATION WITHOUT DEPOSITION OF A LAYER OF BYPRODUCT - Patent 1525333

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EP 1 525 333 A2

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(88)	Date of publication A3:
	21.10.2004

(43)	Date of publication:
	27.04.2005 Bulletin 2005/17

(21)	Application number: 03759186.4

(22)	Date of filing: 01.08.2003

(51)	International Patent Classification (IPC)⁷: C23C 8/36, C23C 14/48, H01J 37/32, H01L 21/223

(86)	International application number:
	PCT/US2003/024158

(87)	International publication number:
	WO 2004/013371 (12.02.2004 Gazette 2004/07)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

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Priority:

02.08.2002 US 400560 P

(71)	Applicant: Varian Semiconductor Equipment Associates Inc.
	Gloucester, MA 01930 (US)

(72)	Inventors:
	WALTHER, Steven, R. Andover, MA 01810 (US) RADOVANOV, Svetlana, B. Marblehead, MA 01945 (US)

(74)	Representative: Beck, Simon Antony et al
	Withers & Rogers,Goldings House,2 Hays Lane London SE1 2HW London SE1 2HW (GB)

(54)	METHOD AND APPARATUS FOR PLASMA IMPLANTATION WITHOUT DEPOSITION OF A LAYER OF BYPRODUCT