METHOD FOR IN-SITU MONITORING OF PATTERNED SUBSTRATE PROCESSING USING REFLECTOMETRY - Patent 1546649

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EP 1 546 649 A1

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(43)	Date of publication:
	29.06.2005 Bulletin 2005/26

(21)	Application number: 03785199.5

(22)	Date of filing: 12.08.2003

(51)	International Patent Classification (IPC)⁷: G01B 11/06, H01L 21/66

(86)	International application number:
	PCT/US2003/025147

(87)	International publication number:
	WO 2004/015364 (19.02.2004 Gazette 2004/08)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
	Designated Extension States:
	AL LT LV MK

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Priority:

13.08.2002 US 403213 P
06.09.2002 US 408619 P
01.11.2002 US 286410
01.11.2002 US 286409
27.03.2003 US 401118

(71)	Applicant: Lam Research Corporation
	Fremont, CA 94538 (US)

(72)	Inventors:
	VENUGOPAL, Vijayakumar, C. Berkeley, CA 94709 (US) PERRY, Andrew, J. Fremont, CA 94536 (US)

(74)	Representative: Browne, Robin Forsythe, Dr.
	Urquhart-Dykes & Lord LLPTower North CentralMerrion Way Leeds LS2 8PA Leeds LS2 8PA (GB)

(54)	METHOD FOR IN-SITU MONITORING OF PATTERNED SUBSTRATE PROCESSING USING REFLECTOMETRY