(19)
(11) EP 1 555 335 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
20.06.2007 Bulletin 2007/25

(43) Date of publication A2:
20.07.2005 Bulletin 2005/29

(21) Application number: 05250172.3

(22) Date of filing: 14.01.2005
(51) International Patent Classification (IPC): 
C23C 18/16(2006.01)
C25D 7/12(2006.01)
C25D 3/32(2006.01)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL BA HR LV MK YU

(30) Priority: 16.01.2004 JP 2004009284

(71) Applicant: Adeka Corporation
Arawaka-ku Tokyo (JP)

(72) Inventors:
  • Kobayashi, Hiromitsu, Asahi Denka Co., Ltd.
    Arakawa-ku Tokyo (JP)
  • Nito, Hirohisa, Asahi Denka Co., Ltd.
    Arakawa-ku Tokyo (JP)
  • Kawamata, Hiromasa, Asahi Denka Co., Ltd.
    Arakawa-ku Tokyo (JP)

(74) Representative: Hamer, Christopher K. et al
Mathys & Squire 120 Holborn
London EC1N 2SQ
London EC1N 2SQ (GB)

   


(54) Additive for plating bath


(57) A plating bath additive and a plating bath using the said additive are provided, which plating bath contains a hydroxyalkanesulfonic acid and which even when applied to an electronic part such as a semiconductor device does not give rise to a problem such as circuit-to-circuit insulation becoming defective. The plating bath additive contains a hydroxyalkanesulfonic acid as a main component and has an alkali metal content of less than 0.05 mass% relative to the hydroxyalkanesulfonic acid. The plating bath incorporates the said additive therein.





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