(19)
(11) EP 1 556 881 A2

(12)

(88) Date of publication A3:
16.09.2004

(43) Date of publication:
27.07.2005 Bulletin 2005/30

(21) Application number: 03809889.3

(22) Date of filing: 30.10.2003
(51) International Patent Classification (IPC)7H01J 37/302, H01J 37/317, H01J 37/304, G03F 7/20
(86) International application number:
PCT/NL2003/000745
(87) International publication number:
WO 2004/040614 (13.05.2004 Gazette 2004/20)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI
Designated Extension States:
AL LT LV MK

(30) Priority: 30.10.2002 US 422758 P

(71) Applicant: MAPPER LITHOGRAPHY IP B.V.
2628 CJ Delft (NL)

(72) Inventors:
  • Wieland, Marco Jan-Jaco
    NL-2628 CJ Delft (NL)
  • Kampherbeek, Bert Jan
    NL-2628 CJ Delft (NL)
  • Van Veen, Alexander Hendrik Vincent
    NL-2628 CJ Delft (NL)
  • KRUIT, Pieter
    NL-2611 EB Delft (NL)

(74) Representative: Nederlof, Etienne C. 
Octrooibureau Vriesendorp & Gaade B.V.,Postbus 266
2501 AW Den Haag
2501 AW Den Haag (NL)

   


(54) ELECTRON BEAM EXPOSURE SYSTEM