(19)
(11) EP 1 573 395 A2

(12)

(43) Date of publication:
14.09.2005 Bulletin 2005/37

(21) Application number: 03767009.8

(22) Date of filing: 31.07.2003
(51) International Patent Classification (IPC)7G03F 1/00
(86) International application number:
PCT/US2003/023948
(87) International publication number:
WO 2004/013693 (12.02.2004 Gazette 2004/07)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
Designated Extension States:
AL LT LV MK

(30) Priority: 01.08.2002 US 210785
01.08.2002 US 210780
01.08.2002 US 210894

(71) Applicant: MOLECULAR IMPRINTS, INC.
Austin, TX 78758-3605 (US)

(72) Inventors:
  • WATTS, Michael, P.C.
    Austin, TX 78730 (US)
  • MCMACKIN, Ian
    Austin, TX 78731 (US)
  • SREENIVASAN, Sidlgata, V.
    Austin, TX 78750 (US)
  • CHOI, Byung-Jin
    Austin, TX 78750 (US)
  • VOISIN, Ronald, D.
    Austin, TX 78759 (US)
  • SCHUMAKER, Norman, E.
    Austin, TX 78735 (US)

(74) Representative: Kirschner, Klaus Dieter 
advotec. Böck, Tappe, Kirschner Patent- und Rechtsanwälte Sollner Strasse 38
81479 München
81479 München (DE)

   


(54) SCATTEROMETRY ALIGNMENT FOR IMPRINT LITHOGRAPHY