METHOD OF FORMING A CAP LAYER HAVING ANTI-REFLECTIVE CHARACTERISTICS ON TOP OF A LOW-K DIELECTRIC - Patent 1576664

(19)

(11)

EP 1 576 664 A1

(12)

(43)	Date of publication:
	21.09.2005 Bulletin 2005/38

(21)	Application number: 03781760.8

(22)	Date of filing: 06.11.2003

(51)	International Patent Classification (IPC)⁷: H01L 21/768, H01L 21/314

(86)	International application number:
	PCT/US2003/035272

(87)	International publication number:
	WO 2004/061949 (22.07.2004 Gazette 2004/30)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
	Designated Extension States:
	AL LT LV MK

(30)

Priority:

23.12.2002 DE 10260619
16.06.2003 US 463910

(71)	Applicant: ADVANCED MICRO DEVICES INC.
	California 94088-3453 (US)

(72)	Inventors:
	RUELKE, Hartmut 01109 Dresden (DE) HOHAGE, Joerg 01309 Dresden (DE) THOMAS, Werner 01109 Dresden (DE) MAUERSBERGER, Frank 01445 Radebeul (DE)

(74)	Representative: Schuster, Thomas
	Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 80538 München 80538 München (DE)

(54)	METHOD OF FORMING A CAP LAYER HAVING ANTI-REFLECTIVE CHARACTERISTICS ON TOP OF A LOW-K DIELECTRIC