(19)
(11) EP 1 579 034 A1

(12)

(43) Date of publication:
28.09.2005 Bulletin 2005/39

(21) Application number: 03808972.8

(22) Date of filing: 17.10.2003
(51) International Patent Classification (IPC)7C23F 13/00, C23F 13/02, C23F 13/04, C23F 13/06
(86) International application number:
PCT/US2003/029133
(87) International publication number:
WO 2004/035865 (29.04.2004 Gazette 2004/18)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
Designated Extension States:
AL LT LV MK

(30) Priority: 17.10.2002 US 271734
12.11.2002 US 291770

(71) Applicant: Applied Semiconductor International, Ltd.
5432 Neuenhof (CH)

(72) Inventors:
  • KHORRAMI, Farshad,
    Brooklyn, NY 11201 (US)
  • DOWLING, David, B.
    New York, NY 10006 (US)

(74) Representative: Poulin, GĂ©rard et al
BREVALEX 3, rue du Docteur Lancereaux
75008 Paris
75008 Paris (FR)

   


(54) SEMICONDUCTIVE CORROSION AND FOULING CONTROL APPARATUS, SYSTEM, AND METHOD