(19)
(11) EP 1 605 308 A8

(12) CORRECTED EUROPEAN PATENT APPLICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 A2)

(48) Corrigendum issued on:
01.03.2006 Bulletin 2006/09

(43) Date of publication:
14.12.2005 Bulletin 2005/50

(21) Application number: 05012232.4

(22) Date of filing: 07.06.2005
(51) International Patent Classification (IPC): 
G03F 7/00(1968.09)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL BA HR LV MK YU

(30) Priority: 11.06.2004 JP 2004173317

(71) Applicant: CANON KABUSHIKI KAISHA
Ohta-ku, Tokyo (JP)

(72) Inventors:
  • Kawakami, Eigo
    Tokyo (JP)
  • Ota, Hirohisa
    Tokyo (JP)
  • Nakamura, Takashi
    Tokyo (JP)
  • Kasumi, Kazuyuki
    Tokyo (JP)
  • Tokita, Toshinobu
    Tokyo (JP)

(74) Representative: Weser, Wolfgang 
Weser & Kollegen, Patentanwälte, Radeckestrasse 43
81245 München
81245 München (DE)

   


(54) Apparatus and method for transferring a pattern


(57) A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, and an irradiation of light for exposing the resist onto the resist includes a mold chuck for holding the mold and for compressing the mold against the resist, and a deformation reducing part for reducing a deformation of the mold when the mold chuck applies a compression force to the mold.