(19)
(11) EP 1 606 839 A2

(12)

(88) Date of publication A3:
25.11.2004

(43) Date of publication:
21.12.2005 Bulletin 2005/51

(21) Application number: 04720118.1

(22) Date of filing: 12.03.2004
(51) International Patent Classification (IPC)7: H01L 21/762
(86) International application number:
PCT/IB2004/001344
(87) International publication number:
WO 2004/081974 (23.09.2004 Gazette 2004/39)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL LT LV MK

(30) Priority: 14.03.2003 FR 0303163

(71) Applicant: S.O.I.Tec Silicon on Insulator Technologies
38190 Bernin (FR)

(72) Inventors:
  • LETERTRE, Fabrice
    F-38000 Grenoble (FR)
  • RAYSSAC, Olivier
    F-38100 Grenoble (FR)

(74) Representative: Le Forestier, Eric et al
Cabinet Régimbeau 20, rue de Chazelles
75847 Paris cedex 17
75847 Paris cedex 17 (FR)

   


(54) A METHOD OF PRODUCING SUBSTRATES OR COMPONENTS ON SUBSTRATES INVOLVING TRANSFER OF A USEFUL LAYER, FOR MICROELECTRONICS, OPTOELECTRONICS, OR OPTICS