(19)
(11) EP 1 609 175 A1

(12)

(43) Date of publication:
28.12.2005 Bulletin 2005/52

(21) Application number: 04704022.5

(22) Date of filing: 21.01.2004
(51) International Patent Classification (IPC)7H01L 21/027, H01L 21/311, G03F 7/09, H01L 21/033, H01L 21/3105, H01L 21/768, H01L 21/308
(86) International application number:
PCT/US2004/001405
(87) International publication number:
WO 2004/095551 (04.11.2004 Gazette 2004/45)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
Designated Extension States:
AL LT LV MK

(30) Priority: 31.03.2003 US 458430 P
05.05.2003 US 484225 P
14.08.2003 US 640577

(71) Applicants:
  • TOKYO ELECTRON LIMITED
    Minato-ku,Tokyo 107-8481 (JP)
  • International Business Machines Corporation
    Armonk, N.Y. 10504 (US)

(72) Inventors:
  • BALASUBRAMANIAM, Vaidyanathan
    Beverly, MA 01915 (US)
  • INAZAWA, Koichiro
    Peabody, MA 01960 (US)
  • WISE, Rich
    New Windsor, NY 12553 (US)
  • MAHOROWALA, Arpan, P.
    Bronxville, NY 10708 (US)
  • PANDA, Siddhartha
    Beacon, NY 12508 (US)

(74) Representative: Flint, Adam 
Beck Greener Fulwood House, 12 Fulwood Place,
London WC1V 6HR
London WC1V 6HR (GB)

   


(54) METHOD AND APPARATUS FOR MULTILAYER PHOTORESIST DRY DEVELOPMENT