(19)
(11) EP 1 612 856 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
08.02.2012 Bulletin 2012/06

(45) Mention of the grant of the patent:
24.08.2011 Bulletin 2011/34

(21) Application number: 04720142.1

(22) Date of filing: 12.03.2004
(51) International Patent Classification (IPC): 
H01L 21/31(2006.01)
 C23C 16/44(2006.01)
(86) International application number:
PCT/JP2004/003269
(87) International publication number:
WO 2004/082009 (23.09.2004 Gazette 2004/39)

(54)

DEVICE FOR CLEANING CVD DEVICE AND METHOD OF CLEANING CVD DEVICE

VORRICHTUNG UND VERFAHREN ZUR REINIGUNG EINER CVD-ANLAGE

DISPOSITIF ET PROCEDE DE NETTOYAGE D'UN DISPOSITIF DE DEPOT CHIMIQUE EN PHASE VAPEUR

(84) Designated Contracting States:
DE FR GB IT NL

(30) Priority: 14.03.2003 JP 2003070329

(43) Date of publication of application:
04.01.2006 Bulletin 2006/01

(73) Proprietors:
  • National Institute of Advanced Industrial Science and Technology
    Tokyo 100-8921 (JP)
  • ULVAC, Inc.
    Chigasaki-shi, Kanagawa 253-8543 (JP)
  • Canon Anelva Corporation
    Kawasaki-shi Kanagawa 215-8550 (JP)
  • SANYO Electric Co., Ltd.
    Moriguchi-shi Osaka 570-8677 (JP)
  • Sony Corporation
    Tokyo 108-0075 (JP)
  • Tokyo Electron Limited
    Tokyo 107-6325 (JP)
  • Hitachi Kokusai Electric Inc.
    Tokyo 101-8980 (JP)
  • Fujitsu Semiconductor Limited
    Kohoku-ku, Yokohama-shi Kanagawa 222-0033 (JP)
  • Renesas Electronics Corporation
    Kanagawa 211-8668 (JP)

(72) Inventors:
  • SAKAI, Katsuo, c/o Matsushita Electric Industrial Co. Ltd.
    Osaka-shi 5406319 (JP)
  • ABE, Kaoru
    Chigasaki-shi, Kanagawa 2538543 (JP)
  • OKURA, Seiji
    Kamakura-shi, Kanagawa 2478501 (JP)
  • SAKAMURA, Masaji
    Tatebayashi-shi Gunma 3740007 (JP)
  • MURATA, Hitoshi
    Tokyo 1078481 (JP)
  • KAMEDA, Kenji
    Kodaira-shi, Tokyo 1878511 (JP)
  • WANI, Etsuo
    Fuchu-shi, Tokyo 1838508 (JP)
  • SEKIYA, Akira, c/o Tsukuba Center National Inst.
    Tsukuba-shi, Ibaraki 305-8565 (JP)

(74) Representative: Taylor, Adam David et al
Dehns St. Bride's House 10 Salisbury Square
London EC4Y 8JD
London EC4Y 8JD (GB)


(56) References cited: : 
EP-A- 1 028 175
JP-A- 6 318 579
JP-A- 8 296 045
JP-A- 2001 174 437
JP-A- 2002 517 740
 WO-A-02/090615
JP-A- 8 176 828
JP-A- 2000 235 955
JP-A- 2002 280 376
   
  • M. NAKAMURA, K. HINO, T. SASAKI, Y. SHIOKAWA: "In situ analysis of perfluoro compounds in semiconductor process exhaust: use of Li1 ion-attachment mass spectroscopy" J. VA. SCI. TECHNOL., vol. 19, no. 4, July 2001 (2001-07), pages 1105-1110,
   
Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).