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<SDOBI lang="en"><B000><eptags><B001EP>......DE....FRGB..IT....NL..........................................................................</B001EP><B005EP>J</B005EP><B007EP>DIM360 Ver 2.15 (14 Jul 2008) -  2999001/0</B007EP></eptags></B000><B100><B110>1612856</B110><B120><B121>CORRECTED EUROPEAN PATENT SPECIFICATION</B121></B120><B130>B8</B130><B132EP>B1</B132EP><B140><date>20120208</date></B140><B150><B151>W1</B151><B153>73</B153><B155><B1551>de</B1551><B1552>Bibliographie</B1552><B1551>en</B1551><B1552>Bibliography</B1552><B1551>fr</B1551><B1552>Bibliographie</B1552></B155></B150><B190>EP</B190></B100><B200><B210>04720142.1</B210><B220><date>20040312</date></B220><B240><B241><date>20051007</date></B241><B242><date>20091111</date></B242></B240><B250>ja</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>2003070329</B310><B320><date>20030314</date></B320><B330><ctry>JP</ctry></B330></B300><B400><B405><date>20120208</date><bnum>201206</bnum></B405><B430><date>20060104</date><bnum>200601</bnum></B430><B450><date>20110824</date><bnum>201134</bnum></B450><B452EP><date>20110112</date></B452EP><B480><date>20120208</date><bnum>201206</bnum></B480></B400><B500><B510EP><classification-ipcr sequence="1"><text>H01L  21/31        20060101AFI20040928BHEP        </text></classification-ipcr><classification-ipcr sequence="2"><text>C23C  16/44        20060101ALI20040928BHEP        </text></classification-ipcr></B510EP><B540><B541>de</B541><B542>VORRICHTUNG UND VERFAHREN ZUR REINIGUNG EINER CVD-ANLAGE</B542><B541>en</B541><B542>DEVICE FOR CLEANING CVD DEVICE AND METHOD OF CLEANING CVD DEVICE</B542><B541>fr</B541><B542>DISPOSITIF ET PROCEDE DE NETTOYAGE D'UN DISPOSITIF DE DEPOT CHIMIQUE EN PHASE VAPEUR</B542></B540><B560><B561><text>EP-A- 1 028 175</text></B561><B561><text>WO-A-02/090615</text></B561><B561><text>JP-A- 6 318 579</text></B561><B561><text>JP-A- 8 176 828</text></B561><B561><text>JP-A- 8 296 045</text></B561><B561><text>JP-A- 2000 235 955</text></B561><B561><text>JP-A- 2001 174 437</text></B561><B561><text>JP-A- 2002 280 376</text></B561><B561><text>JP-A- 2002 517 740</text></B561><B562><text>M. NAKAMURA, K. HINO, T. SASAKI, Y. SHIOKAWA: "In situ analysis of perfluoro compounds in semiconductor process exhaust: use of Li1 ion-attachment mass spectroscopy" J. VA. SCI. TECHNOL., vol. 19, no. 4, July 2001 (2001-07), pages 1105-1110,</text></B562><B565EP><date>20090107</date></B565EP></B560></B500><B700><B720><B721><snm>SAKAI, Katsuo,
c/o Matsushita Electric Industrial Co. Ltd.</snm><adr><str>IP Development Center 19F Matsushita IMB Bldg
3-7 Shiromi 1-chome, Chuo-ku</str><city>Osaka-shi 5406319</city><ctry>JP</ctry></adr></B721><B721><snm>ABE, Kaoru</snm><adr><str>c/o Ulvac, Inc.
2500 Hagisono</str><city>Chigasaki-shi,
Kanagawa 2538543</city><ctry>JP</ctry></adr></B721><B721><snm>OKURA, Seiji</snm><adr><str>c/o Mitsubishi Denki Kabushiki Kaisha
5-1-1 Oofuna</str><city>Kamakura-shi, 
Kanagawa 2478501</city><ctry>JP</ctry></adr></B721><B721><snm>SAKAMURA, Masaji</snm><adr><str>2457-5 Wakamiya-cho,</str><city>Tatebayashi-shi
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32 Miyuki-cho,</str><city>Kodaira-shi,
Tokyo 1878511</city><ctry>JP</ctry></adr></B721><B721><snm>WANI, Etsuo</snm><adr><str>c/o Canon Anelva Corporation
5-8-1 Yotsuya,</str><city>Fuchu-shi,
Tokyo 1838508</city><ctry>JP</ctry></adr></B721><B721><snm>SEKIYA, Akira,
c/o Tsukuba Center National Inst.</snm><adr><str>Of Advanced,
Ind. Sci. And Techn.,
1-1-1, Higashi</str><city>Tsukuba-shi,
Ibaraki 305-8565</city><ctry>JP</ctry></adr></B721></B720><B730><B731><snm>National Institute of Advanced Industrial Science 
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Chiyoda-ku</str><city>Tokyo 100-8921</city><ctry>JP</ctry></adr></B731><B731><snm>ULVAC, Inc.</snm><iid>101235089</iid><irf>12.88940</irf><adr><str>2500 Hagisono</str><city>Chigasaki-shi, Kanagawa 253-8543</city><ctry>JP</ctry></adr></B731><B731><snm>Canon Anelva Corporation</snm><iid>101014859</iid><irf>12.88940</irf><adr><str>2-5-1, Kurigi 
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Kanagawa 215-8550</city><ctry>JP</ctry></adr></B731><B731><snm>SANYO Electric Co., Ltd.</snm><iid>101121976</iid><irf>12.88940</irf><adr><str>5-5, Keihanhondori 2-chome</str><city>Moriguchi-shi
Osaka 570-8677</city><ctry>JP</ctry></adr></B731><B731><snm>Sony Corporation</snm><iid>101002650</iid><irf>12.88940</irf><adr><str>1-7-1 Konan 
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Chiyoda-ku</str><city>Tokyo 101-8980</city><ctry>JP</ctry></adr></B731><B731><snm>Fujitsu Semiconductor Limited</snm><iid>101178594</iid><irf>12.88940</irf><adr><str>2-10-23 Shin-Yokohama</str><city>Kohoku-ku, Yokohama-shi
Kanagawa 222-0033</city><ctry>JP</ctry></adr></B731><B731><snm>Renesas Electronics Corporation</snm><iid>101185194</iid><irf>12.88940</irf><adr><str>1753, Shimonumabe, Nakahara-ku 
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St. Bride's House 
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