(19)
(11) EP 1 626 839 A1

(12)

(43) Date of publication:
22.02.2006 Bulletin 2006/08

(21) Application number: 04715012.3

(22) Date of filing: 26.02.2004
(51) International Patent Classification (IPC): 
B24B 37/04(1968.09)
B24B 49/10(1968.09)
 B24B 53/007(1985.01)
(86) International application number:
PCT/US2004/005523
(87) International publication number:
WO 2004/106000 (09.12.2004 Gazette 2004/50)
(84) Designated Contracting States:
DE GB

(30) Priority: 28.05.2003 DE 10324429
29.12.2003 US 747723

(71) Applicant: ADVANCED MICRO DEVICES, INC.
Sunnyvale, California 94088-3453 (US)

(72) Inventors:
  • KRAMER, Jens
    D-01127 Dresden (DE)
  • STOECKGEN, Uwe, Gunter
    D-01324 Dresden (DE)
  • KUNATH, Jens
    D-01454 Wachau (DE)

(74) Representative: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät 
Maximilianstrasse 58
80538 München
80538 München (DE)

   


(54) A METHOD AND SYSTEM FOR CONTROLLING THE CHEMICAL MECHANICAL POLISHING BY USING A SENSOR SIGNAL OF A PAD CONDITIONER