(19)
(11) EP 1 628 324 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
26.01.2011 Bulletin 2011/04

(45) Mention of the grant of the patent:
15.12.2010 Bulletin 2010/50

(21) Application number: 05255082.9

(22) Date of filing: 17.08.2005
(51) International Patent Classification (IPC): 
H01J 37/34(2006.01)
 C23C 14/35(2006.01)

(54)

Magnetron sputtering device

Magnetron-Sputteranlage

Dispositif de pulvérisation magnétron

(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

(30) Priority: 20.08.2004 US 603211
07.03.2005 US 74249
08.07.2005 US 177465

(43) Date of publication of application:
22.02.2006 Bulletin 2006/08

(73) Proprietor: JDS Uniphase Corporation
Milpitas, CA 95035 (US)

(72) Inventors:
  • Tilsch, Markus K.
    California 95409 (US)
  • Seddon, Richard I.
    California 95404 (US)
  • Ockenfuss, Georg J.
    California 95404 (US)
  • Hayes, Jeremy
    California 95403 (US)
  • Klinger, Robert E.
    California 94928 (US)

(74) Representative: Walker, Stephen et al
Murgitroyd & Company Scotland House 165-169 Scotland Street
Glasgow G5 8PL
Glasgow G5 8PL (GB)


(56) References cited: : 
DE-A1- 3 934 887
US-A- 5 911 861
 US-A- 5 795 448
US-A1- 2001 015 438
   
       
    Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).