PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS - Patent 1641849

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EP 1 641 849 A1

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(43)	Date of publication:
	05.04.2006 Bulletin 2006/14

(21)	Application number: 04777056.5

(22)	Date of filing: 25.06.2004

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International Patent Classification (IPC):

C08F 220/18^(1985.01)

C08F 220/30^(1985.01)

(86)	International application number:
	PCT/US2004/020346

(87)	International publication number:
	WO 2005/000923 (06.01.2005 Gazette 2005/01)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

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Priority:

26.06.2003 US 483310 P
26.06.2003 US 483390 P

(71)	Applicant: Symyx Technologies, Inc.
	Santa Clara, CA 95051 (US)

(72)	Inventors:
	BENOIT, Didier San Jose, CA 95123 (US) SAFIR, Adam Berkeley, CA 94703 (US) CHANG, Han-Ting Livermore, CA 94550 (US) CHARMOT, Dominique Campbell, CA 95008 (US)

(74)	Representative: Strehl Schübel-Hopf & Partner
	Maximilianstrasse 54 80538 München 80538 München (DE)

(54)	PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS