(19)
(11) EP 1 658 635 A1

(12)

(43) Date of publication:
24.05.2006 Bulletin 2006/21

(21) Application number: 04756684.9

(22) Date of filing: 06.07.2004
(51) International Patent Classification (IPC): 
H01L 21/027(1990.01)
H01L 21/308(1974.07)
H01L 21/316(1974.07)
C23C 14/06(1985.01)
 H01L 21/033(1990.01)
H01L 21/314(1974.07)
C23C 16/40(1985.01)
(86) International application number:
PCT/US2004/021598
(87) International publication number:
WO 2005/024922 (17.03.2005 Gazette 2005/11)
(84) Designated Contracting States:
DE GB

(30) Priority: 29.08.2003 DE 10339988
29.04.2004 US 835411

(71) Applicant: ADVANCED MICRO DEVICES, INC.
Sunnyvale, California 94088-3453 (US)

(72) Inventors:
  • RUELKE, Hartmut
    01109 Dresden (DE)
  • HUY, Katja
    01139 Dresden (DE)
  • ROMERO, Karla
    01097 Dresden (DE)

(74) Representative: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät 
Maximilianstrasse 58
80538 München
80538 München (DE)

   


(54) A METHOD OF FORMING A TEOS CAP LAYER AT LOW TEMPERATURE AND REDUCED DEPOSITION RATE