(19)
(11) EP 1 664 924 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
05.12.2012 Bulletin 2012/49

(45) Mention of the grant of the patent:
02.05.2012 Bulletin 2012/18

(21) Application number: 04764051.1

(22) Date of filing: 12.08.2004
(51) International Patent Classification (IPC): 
G03F 1/74(2012.01)
C23F 4/00(2006.01)
H01L 21/3213(2006.01)
 H01J 37/305(2006.01)
H01L 21/768(2006.01)
(86) International application number:
PCT/EP2004/009049
(87) International publication number:
WO 2005/017949 (24.02.2005 Gazette 2005/08)

(54)

METHOD FOR HIGH-RESOLUTION ETCHING OF THIN LAYERS WITH ELECTRON BEAMS

VERFAHREN ZUM HOCHAUFLÖSENDEN ÄTZEN DÜNNER SCHICHTEN MITTELS ELEKTRONENSTRAHLEN

PROCEDE DE GRAVURE AVEC UNE HAUTE RESOLUTION DE COUCHES MINCES AU MOYEN DE FAISCEAUX D' ELECTRONS

(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

(30) Priority: 19.08.2003 DE 10338019

(43) Date of publication of application:
07.06.2006 Bulletin 2006/23

(73) Proprietor: Carl Zeiss SMS GmbH
07745 Jena (DE)

(72) Inventors:
  • KOOPS, Hans, W., P.
    64372 Ober-Ramstadt (DE)
  • EDINGER, Klaus
    64646 Heppenheim (DE)
  • BABIN, Sergey
    Castro Valley, CA 94546 (US)
  • HOFMANN, Thorsten
    63110 Rodgau (DE)
  • SPIES, Maria
    55130 Mainz (DE)

(74) Representative: Heselberger, Johannes 
Bardehle Pagenberg Partnerschaft Patentanwälte, Rechtsanwälte Prinzregentenplatz 7
81675 München
81675 München (DE)


(56) References cited: : 
DE-A1- 3 042 650
US-A- 6 042 738
 US-A- 4 239 954
   
  • JIANHUA WANG ET AL: "Etching characteristics of chromium thin films by an electron beam induced-surface reaction" SEMICONDUCTOR SCIENCE AND TECHNOLOGY IOP PUBLISHING UK, vol. 18, no. 4, 10 February 2003 (2003-02-10), pages 199-205, XP002316580 ISSN: 0268-1242
  • PATENT ABSTRACTS OF JAPAN vol. 007, no. 095 (C-163), 23 August 1983 (1983-08-23) & JP 58 022382 A (MITSUBISHI DENKI KK), 9 February 1983 (1983-02-09)
  • P.L. HAWKES ET AL: "the preparation of microcircuit stencils and patterns by photomechanics and electron beam machining" MICROELCTRONICS AND RELIABILITY, vol. 4, no. 1, 1965, pages 65-79, XP008046017 UK
  • PATENT ABSTRACTS OF JAPAN vol. 1995, no. 04, 31 May 1995 (1995-05-31) & JP 07 011429 A (TOSHIBA CORP), 13 January 1995 (1995-01-13)
   
Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).