PHOTOMASK AND METHOD OF FORMING A PARTIAL-DEPTH FEATURE IN A POLYMER FILM

(19)

(11)

EP 1 664 936 B8

(12)	CORRECTED EUROPEAN PATENT SPECIFICATION
	Note: Bibliography reflects the latest situation

(15)	Correction information:
	Corrected version no 1 (W1 B1)

(48)	Corrigendum issued on:
	08.01.2014 Bulletin 2014/02

(45)	Mention of the grant of the patent:
	04.12.2013 Bulletin 2013/49

(21)	Application number: 04809811.5

(22)	Date of filing: 27.09.2004

(51)

International Patent Classification (IPC):

G03F 1/38^(2012.01)
G03F 1/00^(2012.01)

G03F 1/32^(2012.01)

(86)	International application number:
	PCT/US2004/031732

(87)	International publication number:
	WO 2005/031458 (07.04.2005 Gazette 2005/14)

(54)	PHOTOMASK AND METHOD OF FORMING A PARTIAL-DEPTH FEATURE IN A POLYMER FILM FOTOMASKE UND VERFAHREN ZUR AUSBILDUNG VON STRUKTURELEMENTEN MIT VERRINGERTER TIEFE IN EINEM POLYMERFILM EBAUCHE DE MASQUE ET PROCEDE DE FORMATION DE CARACTERISTIQUES DE PROFONDEUR PARTIELLE DANS UN FILM POLYMERIQUE

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

(30)

Priority:

26.09.2003 US 672201

(43)	Date of publication of application:
	07.06.2006 Bulletin 2006/23

(73)	Proprietor: FlipChip International, LLC
	Phoenix, AZ 85034 (US)

(72)	Inventors:
	JOHNSON, Michael, E. Tempe, AZ 85282 (US) ELENIUS, Peter Scottsdale, AZ 85258 (US)

(74)	Representative: Leaves, Paul et al
	Olswang LLP 90 High Holborn London WC1V 6XX London WC1V 6XX (GB)

(56)

References cited: :

WO-A-01/40869
US-A- 5 725 973
US-A1- 2003 165 641

US-A- 5 585 210
US-A1- 2003 077 522

Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).