(19)
(11) EP 1 675 924 A1

(12)

(43) Date of publication:
05.07.2006 Bulletin 2006/27

(21) Application number: 04785128.2

(22) Date of filing: 28.09.2004
(51) International Patent Classification (IPC): 
C09G 1/02(1968.09)
H01L 21/321(1990.01)
 C09K 3/14(1968.09)
H01L 21/304(1974.07)
(86) International application number:
PCT/US2004/031645
(87) International publication number:
WO 2005/035677 (21.04.2005 Gazette 2005/16)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

(30) Priority: 02.10.2003 US 677433
14.11.2003 US 713709

(71) Applicant: AMCOL INTERNATIONAL CORPORATION
Arlington Heights, Illinois 60004 (US)

(72) Inventors:
  • FANG, Mingming
    Naperville, IL 60563 (US)
  • IANIRO, Michael, R.
    Macon, GA 31220 (US)
  • EISENHOUR, Don
    Grayslake, IL 60030 (US)

(74) Representative: UEXKÜLL & STOLBERG 
Patentanwälte Beselerstrasse 4
22607 Hamburg
22607 Hamburg (DE)

   


(54) CHEMICAL-MECHANICAL POLISHING (CMP) SLURRY AND METHOD OF PLANARIZING COMPUTER MEMORY DISK SURFACES