(19)
(11) EP 1 676 303 A2

(12)

(88) Date of publication A3:
15.09.2005

(43) Date of publication:
05.07.2006 Bulletin 2006/27

(21) Application number: 04817126.8

(22) Date of filing: 24.09.2004
(51) International Patent Classification (IPC): 
H01L 21/3105(1990.01)
(86) International application number:
PCT/US2004/031995
(87) International publication number:
WO 2005/034194 (14.04.2005 Gazette 2005/15)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

(30) Priority: 08.10.2003 US 510024 P
15.09.2004 US 940682

(71) Applicant: Honeywell International Inc.
Morristown, New Jersey 07960 (US)

(72) Inventors:
  • BHANAP, Anil, S.
    Milpitas, CA 95035 (US)
  • RAMOS, Teresa, A.
    San Jose, CA 95112 (US)
  • IWAMOTO, Nancy
    Ramona, CA 92065 (US)
  • LEUNG, Roger, Y.
    San Jose, CA 95120 (US)
  • NAMAN, Ananth
    San Jose, CA 95118 (US)

(74) Representative: Hucker, Charlotte Jane 
Gill Jennings & Every LLP Broadgate House 7 Eldon Street
London EC2M 7LH
London EC2M 7LH (GB)

   


(54) REPAIRING DAMAGE TO LOW-K DIELECTRIC MATERIALS USING SILYLATING AGENTS