(19)
(11) EP 1 682 689 A2

(12)

(88) Date of publication A3:
28.07.2005

(43) Date of publication:
26.07.2006 Bulletin 2006/30

(21) Application number: 04788650.2

(22) Date of filing: 10.09.2004
(51) International Patent Classification (IPC): 
C23C 14/56(2006.01)
B08B 7/00(2006.01)
 C23C 16/44(2006.01)
C23C 14/34(2006.01)
(86) International application number:
PCT/US2004/029387
(87) International publication number:
WO 2005/026408 (24.03.2005 Gazette 2005/12)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

(30) Priority: 11.09.2003 US 505689 P

(71) Applicant: Honeywell International Inc.
Morristown, New Jersey 07960 (US)

(72) Inventors:
  • KIM, Jaeyeon
    Liberty Lake, WA 99019 (US)
  • SAYLES, Scott, R.
    Mead, WA 99021 (US)
  • KARDOKUS, Janine, K.
    Veradale, WA 99037 (US)
  • PHELAN, Terry, J.
    Spokane, WA 99216 (US)

(74) Representative: Fox-Male, Nicholas Vincent Humbert 
Eric Potter Clarkson LLP Park View House 58 The Ropewalk
GB-Nottingham NG1 5DD
GB-Nottingham NG1 5DD (GB)

   


(54) METHODS OF TREATING COMPONENTS OF A DEPOSITION APPARATUS TO FORM PARTICLE TRAPS, AND SUCH COMPONENTS HAVING PARTICLE TRAPS THEREON