(19)
(11) EP 1 689 574 A2

(12)

(88) Date of publication A3:
04.08.2005

(43) Date of publication:
16.08.2006 Bulletin 2006/33

(21) Application number: 04816977.5

(22) Date of filing: 18.11.2004
(51) International Patent Classification (IPC): 
B29C 47/00(2006.01)
(86) International application number:
PCT/US2004/039322
(87) International publication number:
WO 2005/055693 (23.06.2005 Gazette 2005/25)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LU MC NL PL PT RO SE SI SK TR

(30) Priority: 05.12.2003 US 527507 P

(71) Applicant: Freudenberg Nonwovens, L.P.
Lowell, MA 01852 (US)

(72) Inventors:
  • SCHNEIDER, Joseph c/o Freudenberg Nonwovens, LP
    Lowell, Massachusetts 01852 (US)
  • HSU, Oscar
    Chelmsford, Massachusetts 01824 (US)
  • WILHEIM, Volker c/o Freudenberg Nonwovens, L.P.
    Lowell, Massachusetts 01852 (US)
  • WATKA, Greg c/o Freudenberg Nonwovens, L.P.
    Lowell, Massachusetts 01852 (US)
  • HACKLER, Lothar c/o Freudenberg Nonwovens, L.P.
    Lowell, Massachusetts 01852 (US)

(74) Representative: Gudat, Axel 
Lippert, Stachow & Partner Frankenforster Strasse 135-137
51427 Bergisch Gladbach
51427 Bergisch Gladbach (DE)

   


(54) PROCESS AND APPARATUS TO CONTINUOUSLY FORM A UNIFORM SHEET FOR USE AS A SEMICONDUCTOR POLISHING PAD