<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE ep-patent-document PUBLIC "-//EPO//EP PATENT DOCUMENT 1.4//EN" "ep-patent-document-v1-4.dtd">
<ep-patent-document id="EP06300207B8W1" file="EP06300207W1B8.xml" lang="fr" country="EP" doc-number="1703547" kind="B8" correction-code="W1" date-publ="20120314" status="c" dtd-version="ep-patent-document-v1-4">
<SDOBI lang="fr"><B000><eptags><B001EP>ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIRO..CY..TRBGCZEEHUPLSK....IS..............................</B001EP><B005EP>J</B005EP><B007EP>DIM360 Ver 2.15 (14 Jul 2008) -  2999001/0</B007EP></eptags></B000><B100><B110>1703547</B110><B120><B121>FASCICULE DE BREVET EUROPEEN CORRIGE</B121></B120><B130>B8</B130><B132EP>B1</B132EP><B140><date>20120314</date></B140><B150><B151>W1</B151><B153>73</B153><B155><B1551>de</B1551><B1552>Bibliographie</B1552><B1551>en</B1551><B1552>Bibliography</B1552><B1551>fr</B1551><B1552>Bibliographie</B1552></B155></B150><B190>EP</B190></B100><B200><B210>06300207.5</B210><B220><date>20060307</date></B220><B240><B241><date>20081010</date></B241><B242><date>20090429</date></B242></B240><B250>fr</B250><B251EP>fr</B251EP><B260>fr</B260></B200><B300><B310>0550703</B310><B320><date>20050318</date></B320><B330><ctry>FR</ctry></B330></B300><B400><B405><date>20120314</date><bnum>201211</bnum></B405><B430><date>20060920</date><bnum>200638</bnum></B430><B450><date>20110914</date><bnum>201137</bnum></B450><B452EP><date>20110316</date></B452EP><B472><B475><date>20110914</date><ctry>AT</ctry><date>20110914</date><ctry>FI</ctry><date>20111215</date><ctry>GR</ctry><date>20110914</date><ctry>LT</ctry><date>20110914</date><ctry>LV</ctry><date>20110914</date><ctry>SE</ctry><date>20110914</date><ctry>SI</ctry></B475></B472><B480><date>20120314</date><bnum>201211</bnum></B480></B400><B500><B510EP><classification-ipcr sequence="1"><text>H01L  21/00        20060101AFI20060405BHEP        </text></classification-ipcr></B510EP><B540><B541>de</B541><B542>Verfahren und Vorrichtung zur Kontrolle der Verunreinigung von Wafersubstraten</B542><B541>en</B541><B542>Method and device for controlling the contamination of wafer substrates</B542><B541>fr</B541><B542>Procédé et dispositif pour le contrôle de la contamination des plaquettes de substrat</B542></B540><B560><B561><text>DE-A1- 10 133 520</text></B561><B561><text>US-A- 5 233 191</text></B561><B561><text>US-A1- 2004 023 419</text></B561><B561><text>US-B1- 6 287 023</text></B561></B560></B500><B700><B720><B721><snm>Favre, Arnaud</snm><adr><str>
17bis, avenue de Novel</str><city>74000, ANNECY</city><ctry>FR</ctry></adr></B721><B721><snm>Thollot, Rémi</snm><adr><str>
196, rue du Mont Blanc</str><city>74350, CRUSEILLES</city><ctry>FR</ctry></adr></B721><B721><snm>Metais, Xavier</snm><adr><str>3, rue Fançois Vernex</str><city>74960 Meythet</city><ctry>FR</ctry></adr></B721><B721><snm>Desbiolles, Jean-Pierre</snm><adr><str>
Les Follats</str><city>74350, CRUSEILLES</city><ctry>FR</ctry></adr></B721></B720><B730><B731><snm>Adixen Vacuum Products</snm><iid>101253024</iid><irf>F°105954/MAH/TP</irf><adr><str>98 Avenue de Brogny</str><city>74009 Annecy</city><ctry>FR</ctry></adr></B731></B730><B740><B741><snm>Croonenbroek, Thomas Jakob</snm><iid>100820365</iid><adr><str>Cabinet Innovincia 
11, avenue des Tilleuls</str><city>74200 Thonon-les-Bains</city><ctry>FR</ctry></adr></B741></B740></B700><B800><B840><ctry>AT</ctry><ctry>BE</ctry><ctry>BG</ctry><ctry>CH</ctry><ctry>CY</ctry><ctry>CZ</ctry><ctry>DE</ctry><ctry>DK</ctry><ctry>EE</ctry><ctry>ES</ctry><ctry>FI</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>GR</ctry><ctry>HU</ctry><ctry>IE</ctry><ctry>IS</ctry><ctry>IT</ctry><ctry>LI</ctry><ctry>LT</ctry><ctry>LU</ctry><ctry>LV</ctry><ctry>MC</ctry><ctry>NL</ctry><ctry>PL</ctry><ctry>PT</ctry><ctry>RO</ctry><ctry>SE</ctry><ctry>SI</ctry><ctry>SK</ctry><ctry>TR</ctry></B840><B880><date>20080820</date><bnum>200834</bnum></B880></B800></SDOBI>
</ep-patent-document>
