ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIROMKCYALTRBGCZEEHUPLSKBAHRISYU........JDIM360 (Ver 1.5 21 Nov 2005) - 1620000/01710624EUROPEAN PATENT APPLICATIONA320070801EP06003314.920060217enenen200510994320050406JP2007080120073120061011200641G03F 7/00 20060101AFI20060904BHEP B81C 1/00 20060101ALI20070621BHEP G03F 1/00 20060101ALI20070621BHEP G11B 7/26 20060101ALN20070621BHEP B29C 45/26 20060101ALN20070621BHEP G11B 5/84 20060101ALN20070621BHEP G11B 5/855 20060101ALN20070621BHEP deVerfahren zur Herstellung eines Druckstempels mit Mikro- und Nanostrukturen für Nanoimprint und Verwendung der Form für eine Nanoimprint-VorrichtungenMethods of fabricating nano-scale and micro-scale mold for nano-imprint, and mold usage on nano-imprinting equipmentfrProcédés de fabrication d'un moule à l'échelle nanométrique et à l'échelle micrométrique pour la lithographie par nano-impression, et emploi du moule avec un équipement de lithographie par nano-impression1Hitachi, Ltd.0020415981-63.237EP/AS/6-6, Marunouchi 1-chome Chiyoda-kuTokyoJPOhashi, KenyaHitachi, Ltd., 12th Floor, 6-1, Marunouchi1-chome, Chiyoda-ku, Tokyo 100-8220JPMiyauchi, AkihiroHitachi, Ltd., 12th Floor, 6-1, Marunouchi1-chome, Chiyoda-ku, Tokyo 100-8220JPOgino, MasahikoHitachi, Ltd., 12th Floor, 6-1, Marunouchi1-chome, Chiyoda-ku, Tokyo 100-8220JPBeetz & Partner00103261Patentanwälte, Steinsdorfstrasse 1080538 MünchenDEATBEBGCHCYCZDEDKEEESFIFRGBGRHUIEISITLILTLULVMCNLPLPTROSESISKTRALBAHRMKYU20070801200731

To provide a metal mold (101) excellent in the mold-release characteristic and the transfer accuracy in a nano-imprint method. By controlling the thickness of a metal oxide film (103) formed in the face of a release agent and a mold, the adhesive amount of the release agent layer formed in the outer layer thereof is adjusted, thereby forming a mold excellent in the mold-release characteristic. The present invention also relates to methods of fabricating molds for nano-imprint, and mold usage on nano-imprinting equipment.