TECHNICAL FIELD
[0001] The present invention relates to a solid electrolytic capacitor and fabrication method
therefor.
BACKGROUND ART
[0002] Recently, miniaturization of electronic machines has been bringing a demand for development
of small-sized capacitors having a large capacity.
[0003] As one of such capacitors having a large capacity, solid electrolytic capacitors
with a high capacitance, using as a dielectric material an amorphous niobium oxide
whose electrical insulation is high and dielectric constant is 1.8 times higher than
that of tantalum oxide of a material used for conventional solid electrolytic capacitors,
have been focused on.
[0004] Unfortunately, the conventional solid electrolytic capacitors using niobium oxide
as the dielectric material have problems that they are easily affected by heat-treatment,
such as a reflow soldering process and their capacitance stability is easily deteriorated
compared with solid electrolytic capacitors using another dielectric materials such
as tantalum oxide.
[0006] However, even in such a solid electrolytic capacitor in which the dielectric layer
is composed of niobium oxide wherein the niobium nitride region is formed, one part
of the amorphous niobium oxide is crystallized by the heat-treatment, such as the
reflow soldering process. As a consequence, a crystal of niobium oxide with a decreased
electrical insulation is contained in the dielectric layer, and the electrical insulation
of the dielectric layer is decreased.
[0007] Further, volume change occurs in niobium oxide in accordance with change of state
thereof from being amorphous to crystal. Then, a crack in the dielectric layer is
easily occurred due to crystallization of niobium oxide. Thus, there has been a problem
that short circuit between an anode and a cathode formed on the surface of the dielectric
layer is easily occurred.
[0008] Still further, the solid electrolytic capacitor in which the dielectric layer is
composed of niobium oxide wherein the niobium nitride region is formed has problems
that diffusion of oxygen is not fully suppressed and thickness of the dielectric layer
is easily decreased.
[0009] As a consequence, a problem with the conventional solid electrolytic capacitors has
been that it impossible to sufficiently reduce leakage current between the anode and
the cathode.
DISCLOSURE OF THE INVENTION
PROBLEMS TO BE SOLVED
[0010] The invention is directed to a solution to the aforementioned problems with the solid
electrolytic capacitor in which the dielectric layer is composed of niobium oxide.
[0011] Specifically, the invention has an object to provide a solid electrolytic capacitor
in which the dielectric layer is composed of niobium oxide having less occurrence
of leakage current and a fabrication method therefor.
SOLUTION TO THE PROBLEMS
[0012] In order to solve the problems mentioned above, a solid electrolytic capacitor according
to the present invention comprises: an anode formed of niobium or niobium alloy; a
first dielectric layer containing niobium and oxygen whose major component is niobium
or oxygen formed on the anode; a second dielectric layer containing phosphorus or
sulfur in addition to niobium and oxygen formed on the first dielectric layer and
a cathode formed on the second dielectric layer. The aforesaid niobium and oxygen
forms niobium oxide, therefore, the first dielectric layer is composed of niobium
oxide whose major component is niobium or oxygen and the second dielectric layer is
composed of niobium oxide containing phosphorus or sulfur.
[0013] In the solid electrolytic capacitor of the present invention, phosphorus or sulfur
is contained in the second dielectric layer which is one of the dielectric layer composed
of niobium oxide and is located on the cathode side (the face side), so that crystallization
of niobium oxide in the second dielectric layer is restrained by phosphorus or sulfur.
[0014] Therefore, even if heat-treatment of the reflow soldering process and the like is
conducted, generation of crystalline niobium oxide with a decreased electrical insulation
in the second dielectric layer located on the cathode side (the face side) is restrained,
so that a decrease in the electrical insulation of the dielectric layer on the face
side is prevented. Further, volume change in accordance with crystallization of niobium
oxide is suppressed, and therefore, an occurrence of a crack on the surface of the
dielectric layer is restrained. Thus, the aforesaid second dielectric layer functions
as a surface protective layer of the dielectric layer. As a consequence of restraint
of the crack on the surface of the dielectric layer as described above, the crack
extending to the inside of the dielectric layer is also restrained and a short circuit
between the abode and the cathode is suppressed.
[0015] As a consequence, with the solid electrolytic capacitor of the present invention,
the decrease in the electrical insulation of the dielectric layer and the crack on
the dielectric layer are restrained, so that occurrence of the leakage current is
remarkably reduced.
[0016] In the solid electrolytic capacitor of the present invention, it is preferable that
fluorine is contained in the first dielectric layer. The reason is that when fluorine
is contained in the first dielectric layer, as the same as phosphorus or sulfur, the
crystallization of niobium oxide is restrained and the occurrence of the leakage current
in the solid electrolytic capacitor is further reduced.
[0017] Moreover, in cases where fluorine is contained in the first dielectric layer, it
is preferable that fluorine concentration is increased toward the anode side from
the cathode side. By such a way, the fluorine concentration on the anode side becomes
higher, and as a result, a region containing niobium fluoride is easily formed on
parts of the anode side of the first dielectric layer. Further, because it becomes
difficult to diffuse oxygen in the region of niobium oxide containing niobium fluoride,
diffusion of oxygen from the dielectric layer to the anode is suppressed when the
aforesaid region containing niobium fluoride is formed at a boundary face of the dielectric
layer and the anode. Thus, a decrease of thickness of the dielectric layer resulted
from a decrease of oxygen in the dielectric layer is prevented, so that the decrease
in the electrical insulation of the dielectric layer is suppressed.
[0018] A fabrication method for the solid electrolytic capacitor of the present invention
comprises steps of: forming the first dielectric layer whose major component is niobium
or oxygen by anodizing the anode of niobium or niobium alloy in a first aqueous solution;
forming the second dielectric layer containing phosphorus or sulfur in addition to
niobium and oxygen on the first dielectric layer by anodizing the anode formed with
the first dielectric layer in a second aqueous solution containing phosphate ion or
sulfate ion; and forming the cathode on the second dielectric layer.
[0019] In the fabrication method for the solid electrolytic capacitor of the present invention,
the anode formed with the first dielectric layer is anodized in the second aqueous
solution containing phosphate ion or sulfate ion, and therefore, phosphorus or sulfur
is contained in the second dielectric layer located on the cathode side (the face
side), so that the crystallization of niobium oxide does not occur easily and the
decrease of the electrical insulation on the face side of the dielectric layer is
restrained preventing the clack on the surface of the dielectric layer and the short
circuit between the anode and the cathode is suppressed.
[0020] As a consequence, according to the fabrication method for the solid electrolytic
capacitor of the present invention, the decrease of the electrical insulation of the
dielectric layer is restrained preventing the crack on the dielectric layer, and therefore,
a solid electrolytic capacitor having less occurrence of leakage current can be easily
fabricated.
[0021] Further, it is preferable that an aqueous solution containing fluoride ion is used
as the first aqueous solution in the fabrication method for the solid electrolytic
capacitor of the present invention. In cases where the anode of niobium or niobium
alloy is anodized in the first aqueous solution containing fluoride ion, fluorine
is contained in the first dielectric layer. As a consequence, the crystallization
of niobium oxide in the first dielectric layer is restrained by fluorine and the occurrence
of the leakage current in the solid electrolytic capacitor is further reduced.
[0022] Moreover, in cases where the anode of niobium or niobium alloy is anodized in the
first aqueous solution containing fluoride ion as described above, the fluorine concentration
becomes high on the anode side and the region containing niobium fluoride is formed
on the parts of the anode side of the first dielectric layer, and as a result, the
diffusion of oxygen from the dielectric layer to the anode is suppressed. Thus, the
decrease of the thickness of the dielectric layer resulted from the decrease of oxygen
in the dielectric layer is prevented restraining the decrease of the electrical insulation
of the dielectric layer and the occurrence of the leakage current in the solid electrolytic
capacitor is further reduced.
[0023] Further, in cases where the anode of niobium or niobium alloy is anodized in the
first aqueous solution containing fluoride ion, the fluoride ion dissolves the surface
of the anode of niobium or niobium alloy and uneven shapes are formed on the surface
of the anode, so that the surface area of the anode is increased. Where capacitance
C is proportional to the surface area of the anode, equivalent series resistance (ESR)
in high frequency regions is proportional to 1/(2πfC)
1/2 in the case that frequency is represented by f. Therefore, when the surface area
of the anode is increased as described above, the capacitance is increased and the
equivalent series resistance (ESR) in high frequency regions is reduced.
BEST MODES FOR CARRYING OUT THE INVENTION
[0024] A solid electrolytic capacitor and fabrication method therefor according to the invention
will hereinbelow be described in details with reference to the accompanying drawings.
It is to be noted that the solid electrolytic capacitor and fabrication method therefor
of the invention is not limited by those illustrated in the following embodiments
and may be practiced in modifications thereof as required so long as such modifications
do not deviate from the scope of the invention.
[0025] Fig.1 is a structural cross-sectional view of a solid electrolytic capacitor according
to an embodiment of the present invention.
[0026] In a solid electrolytic capacitor 100 according to the embodiment, a dielectric layer
2 of niobium oxide with high electrical insulation is formed on the surface of an
anode 1 of a porous sintered body prepared by sintering and molding niobium particles
in a vacuum for covering the circumference of the anode 1 as shown in Fig.1.
[0027] The aforesaid dielectric layer 2 is composed of a first dielectric layer 21 formed
on the anode 1 for covering the circumference of the anode 1 and a second dielectric
layer 22 formed on the first dielectric layer 21 for covering the circumference of
the first dielectric layer 21.
[0028] The aforesaid first dielectric layer 21 contains fluorine and fluorine concentration
becomes lower toward the side of the second dielectric layer 22 from the anode 1 side.
The second dielectric layer 22 contains phosphorus or sulfur.
[0029] Further, an electrolyte layer 3 is formed on the dielectric layer 2 for covering
the circumference of the dielectric layer 2. As materials for the electrolyte layer
3, conducting polymer such as polypyrrole and polythiophene, and manganese dioxide
and the like are used.
[0030] A cathode 4 is formed on the electrolyte layer 3 for covering the circumference
of the electrolyte layer 3. The aforesaid cathode 4 is composed of a first conducting
layer 4a formed for covering the circumference of the electrolyte layer 3 and a second
conducting layer 4b formed for covering the circumference of the first conducting
layer 4a. Further, carbon paste or the like is used for the first conducting layer
4a and silver particles and silver paste consisting of protecting colloid and organic
solvent are used for the second conducting layer 4b. The protective colloid is hydrophilic
colloid which is added in order to increase stability of hydrophobic colloid to an
electrolyte (
According to Physics and Chemistry Dictionary, Fifth edition P.1300, Iwanami syoten).
[0031] Further, a conducting adhesive layer 5 is formed on the one face of the cathode 4
(corresponding to the top face in Fig.1) and a cathode terminal 6 is connected to
the cathode 4 via the conducting adhesive layer 5.
[0032] On the other hand, one part of an anode lead 1a is embedded in the anode 1. An anode
terminal 7 is connected to one end part of the anode lead 1a protruding throughout
the dielectric layer 2 by welding.
[0033] Further, a mold outer resin 8 is provided on the circumference of the solid electrolytic
capacitor for thrusting one end of the cathode terminal 6 and that of the anode terminal
7 outside.
[0034] Next, a fabrication method for the solid electrolytic capacitor 100 shown in Fig.1
will be described as follows.
[0035] One part of the anode lead 1a is embedded in niobium powder molded in the fixed shape.
Under such a condition, the niobium powder is sintered to form the anode 1 of porous
sintered body of niobium in which one part of the anode lead 1a is embedded. In this
case, niobium particles in the porous sintered body are mutually bonded.
[0036] Then, the anode 1 is anodized in a first aqueous solution containing fluoride ion,
for example, an aqueous solution containing ammonium fluoride, so that the first dielectric
layer 21 of niobium oxide containing fluorine is formed for covering the circumference
of the anode 1. In this case, the fluorine concentration becomes lower toward the
face side of the first dielectric layer 21 (the side of the second dielectric layer
22) from the anode 1 side.
[0037] Next, the anode 1 formed with the first dielectric layer 21 is anodized in a second
aqueous solution. The second aqueous solution is the aqueous solution containing phosphate
ion, for example, phosphate solution or the aqueous solution containing sulfate ion,
for example, sulfate solution. Thus, the second dielectric layer 22 of niobium oxide
containing phosphorus or sulfur is formed for covering the circumference of the first
dielectric layer 21. As a result, the dielectric layer 2 whose main component is niobium
oxide with high electrical insulation composed of the first dielectric layer 21 and
the second dielectric layer 22 disposed in the order on the surface of the anode 1
is formed.
[0038] Then, the electrolyte layer 3 comprising the conducting polymer such as polypyrrole
and polythiophene, and manganese dioxide and the like is formed for covering the circumference
of the dielectric layer 2. In forming the electrolyte layer 3 comprising the conducting
polymer, various polymerization processes can be applied. In forming the electrolyte
layer 3 comprising manganese dioxide, pyrolysis process can be applied. In cases where
the electrolyte layer 3 is formed in the manner as described above, the electrolyte
layer 3 is formed on the surface of the dielectric layer 2 for filling spaces of the
dielectric layer 2 on the surface of the porous sintered body of the anode 1.
[0039] Then, carbon paste or the like is applied on the electrolyte layer 3 and dried at
fixed temperature to form the first conducting layer 4a for covering the circumference
of the electrolyte layer 3. Further, silver paste or the like is applied on the first
conducting layer 4a and being dried at the fixed temperature to form the second conducting
layer 4b for covering the circumference of the first conducting layer 4a. Thus, the
cathode 4 composed of the first conducting layer 4a and the second conducting layer
4b is formed.
[0040] Next, a conducting adhesive agent is applied on the cathode terminal 6. The cathode
4 and the cathode terminal 6 are contacted via the conducting adhesive agent. Under
such a circumstance, the conducting adhesive agent is dried to form the conducting
adhesive layer 5 and the cathode 4 and the cathode terminal 6 are connected each other
via the conducting adhesive layer 5.
[0041] The anode terminal 7 is connected on the anode lead 1a protruding from the dielectric
layer 2, the electrolyte layer3 and the cathode 4 by welding.
[0042] After that, the mold outer resin 8 is formed on the circumference of the cathode
4, the cathode terminal 6 and the anode terminal 7 for thrusting the one end of the
cathode terminal 6 and that of the anode terminal 7 outside. Thus, the solid electrolytic
capacitor 100 is fabricated.
[0043] In the solid electrolytic capacitor 100 according to the embodiment, the second dielectric
layer 22 composed of niobium oxide containing phosphorus or sulfur is formed on the
face side of the dielectric layer 2, that is, the side where the electrolyte layer
3 and the cathode 4 are formed, so that generation of crystalline niobium oxide with
a decreased electrical insulation in the second dielectric layer 22 is restrained
even if heat-treatment of the reflow soldering process and the like is conducted.
As a consequence, a decrease in the electrical insulation of the second dielectric
layer 22 on the face side of the dielectric layer 2 is prevented.
[0044] Thus, crystallization of niobium oxide in the second dielectric layer 22 is restrained
and occurrence of a crack on the surface of the second dielectric layer 22 is prevented.
As a consequence, the crack extending to the inside of the dielectric layer 2 is also
restrained and a short circuit between the abode 1 and the cathode 4 is suppressed.
[0045] Therefore, according to the embodiment, the decrease of the electrical insulation
of the dielectric layer 2 is restrained and the solid electrolytic capacitor 100 having
less occurrence of leakage current can be obtained.
[0046] In the solid electrolytic capacitor 100 according to the embodiment, fluorine having
an effect of restraining the crystallization of niobium oxide is contained in the
first dielectric layer 21, therefore it is possible to further reduce the occurrence
of the leakage current.
[0047] Moreover, because fluorine concentration is increased toward the anode 1 side from
the cathode 4 side, the fluorine concentration on the anode 1 side in the first dielectric
layer 21 becomes higher. Thus, a region containing niobium fluoride is easily formed
at a boundary face of the first dielectric layer 21 and the anode 1. Further, because
the region containing niobium fluoride is formed at the boundary face of the first
dielectric layer 21 and the anode 1 has a function of suppressing diffusion of oxygen
from the first dielectric layer 21 to the anode 1, a decrease of oxygen in the dielectric
layer 2 is suppressed. As a consequence, a decrease of thickness of the dielectric
layer 2 is prevented and a decrease in electrical insulation of the dielectric layer
2 is restrained, so that the occurrence of the leakage current is reduced.
[0048] In the embodiment, the anode 1 formed with the first dielectric layer 21 is anodized
in the second aqueous solution containing phosphate ion or sulfate ion, therefore
phosphorus or sulfur is contained in the second dielectric layer 22 which is of the
dielectric layer 2 composed of the first dielectric layer 21 and the second dielectric
layer 22 comprising niobium oxide and is located on the face side where the electrolyte
layer 3 and the cathode 4 are formed.
[0049] As phosphorus or sulfur is contained in the second dielectric layer 22 located on
the face side of the dielectric layer 2, the crystallization of niobium oxide does
not occur easily and the decrease of the electrical insulation on the surface of the
dielectric layer is restrained.
[0050] Further, as the crystallization of niobium oxide in the dielectric layer 2 is restrained,
the occurrence of the crack on the surface of the dielectric layer 2 is prevented.
Therefore, the crack extending to the inside of the dielectric layer 2 is also prevented
and the short circuit between the abode 1 and the cathode 4 is suppressed.
[0051] As described above, the decrease of the electrical insulation of the dielectric layer
2 is restrained and the occurrence of the crack on the dielectric layer 2 is prevented.
Thus, the solid electrolytic capacitor 100 having less occurrence of the leakage current
can be obtained.
[0052] Then, in the embodiment, as the anode 1 of niobium is anodized in the first aqueous
solution containing fluoride ion to form the first dielectric layer 21, fluorine is
easily contained in the first dielectric layer 21. Thus, the crystallization of niobium
oxide in the first dielectric layer 21 is restrained because of fluorine contained
as described above.
[0053] Moreover, in the cases where the first dielectric layer 21 is formed as described
above, fluorine concentration is increased toward the anode 1 side from the cathode
4 side and the fluorine concentration on the anode 1 side of the first dielectric
layer 21 becomes higher. Thus, the region containing niobium fluoride having the function
of suppressing the diffusion of oxygen from the dielectric layer 2 to the anode 1
is easily formed at the boundary face of the dielectric layer 2 and the anode 1. As
a consequence, the decrease of oxygen in the dielectric layer 2 is restrained and
the decrease of the thickness of the dielectric layer 2 is prevented, so that the
occurrence of the leakage current is reduced.
[0054] Further, in the cases where the anode 1 of niobium is anodized in the first aqueous
solution containing fluoride ion, the fluoride ion dissolves the surface of the anode
1 of niobium and uneven shapes are formed on the surface of the anode 1. As a consequence,
the surface area of the anode 1 is increased and the capacitance of the solid electrolytic
capacitor 100 is increased, so that the equivalent series resistance in high frequency
regions (ESR) is reduced.
[0055] In the embodiment, because the anode 1 is composed of the porous sintered body, it
has a large surface area and a large capacity can be obtained. The porous sintered
body is used as the anode 1 in the embodiment as described above, however, the description
shall not be construed to limit the type of the anode, and for example, a metal leaf
of niobium may be used as the anode in the present invention. As materials for the
anode 1, not only niobium as an element, but also niobium alloy containing elements
such as tungsten, vanadium, zinc, aluminum, molybdenum, hafnium and zirconium can
be used.
[0056] Further, in the embodiment, the electrolyte layer 3 is formed between the dielectric
layer 2 and the cathode 4, however, the solid electrolytic capacitor of the present
invention shall not be limited by the above description and it is possible to form
the cathode 4 directly on the dielectric layer 2 without formation of the electrolyte
layer 3.
EXAMPLES
[0057] Hereinafter, a solid electrolytic capacitor according to examples of the present
invention will specifically be described while comparative examples will be cited
to demonstrate that the examples of the inventive solid electrolytic capacitor are
improved in remarkable reduction of leakage current.
(Example 1)
[0058] Fig. 2 shows an illustrative view of a solid electrolytic capacitor of Example 1
and evaluation method thereof. In Example 1, a solid electrolytic capacitor A is fabricated
by the method described as follows.
[0059] A porous sintered body of niobium, which is about 2.8 mm. high, about 3.3 mm. wide
and about 1.7 mm. deep formed for embedding one part of an anode lead 1a therein was
used as an anode 1 in Example 1.
[0060] The anode 1 was anodized at a constant voltage of about 10 V in an aqueous solution
containing about 0. 5 wt% of ammonium fluoride (concentration of fluoride ion: about
0.05 wt%) kept at about 60 °C for about 2 hours to form a first dielectric layer 21
for covering the circumference of the anode 1. The aforesaid aqueous solution containing
ammonium fluoride is one example of a first aqueous solution containing fluoride ion.
[0061] Next, the anode 1 formed with the first dielectric layer 21 was anodized at the
constant voltage of about 10 V in about 0.5 wt% of phosphate solution kept at about
60 °C for about 2 hours to form a second dielectric layer 22 for covering the circumference
of the first dielectric layer 21. The aforesaid phosphate solution is one example
of a second aqueous solution containing phosphate ion.
[0062] Thus, a dielectric layer 2 composed of the first dielectric layer 21 and the second
dielectric layer 22 was formed for covering the circumference of the anode 1.
[0063] Next, an electrolyte layer 3 of polypyrrole was formed by polymerization process
for covering the circumference of the dielectric layer 2.
[0064] Then, a first conducting layer 4a is formed by applying carbon paste or the like
on the circumference of the electrolyte layer 3 and being dried at fixed temperature
and the second conducting layer 4b is formed by applying silver paste or the like
on the circumference of the first conducting layer 4a and being dried at the fixed
temperature. Further, a cathode 4 composed of the first conducting layer 4a and the
second conducting layer 4b was formed on the electrolyte layer 3. Thus fabricated
was the solid electrolytic capacitor A of Example 1.
(Comparative Example 1)
[0065] In Comparative Example 1, a solid electrolytic capacitor X1 was fabricated in the
same manner as in Example 1 except that the step of forming the second dielectric
layer 22 of Example 1 was omitted. In other words, a dielectric layer is composed
of only the first dielectric layer in the solid electrolytic capacitor X1 of Comparative
Example 1.
(Comparative Example 2)
[0066] In Comparative Example 2, a solid electrolytic capacitor X2 was fabricated in the
same manner as in Example 1 except that the step of forming the first dielectric layer
21 of Example 1 was omitted and time for anodic oxidation for forming the second dielectric
layer 22 was changed to about 10 hours. In other words, a dielectric layer was composed
of only the second dielectric layer in the solid electrolytic capacitor X2 of Comparative
Example 2.
(Comparative Example 3)
[0067] In Comparative Example 3, a solid electrolytic capacitor X3 was fabricated in the
same manner as in Example 1 except that the step of forming the second dielectric
layer 22 of Example 1 was omitted as the same as Comparative Example 1 and about 0.5
wt% of hydrochloric acid was used instead of the aqueous solution containing 0.5 wt%
of ammonium fluoride as the first aqueous solution. In the solid electrolytic capacitor
X3 of Comparative Example 3, a dielectric layer is composed of only the first dielectric
layer and fluorine is not contained in the dielectric layer.
(Comparative Example 4)
[0068] In Comparative Example 4, a solid electrolytic capacitor X4 was fabricated in the
same manner as in Comparative Example 2 except that the step of forming the first
dielectric layer 21 of Example 1 was omitted as the same as Comparative Example 2
and the anode 1 used in Example 1 was heat-treated in nitrogen ambient of about 300
Torr (about 4 × 10
-4 Pa) at about 600 °C for about 5 minutes.
[0069] In cases where the anode of niobium was heat-treated in nitrogen ambient as described
above, a layer of niobium nitride was formed on the anode.
[0070] A second dielectric layer was formed as the same as in Example 1 on the anode wherein
the layer of niobium nitride was formed. Thus, the dielectric layer of niobium oxide
composed of a niobium nitride region was formed on the anode.
[0072] In the solid electrolytic capacitor A of Example 1, at the stage of forming the dielectric
layer 2 composed of the first dielectric layer 21 and the second dielectric layer
22 for covering the circumference of the anode 1, the dielectric layer 2 was analyzed
by ESCA (Electron Spectroscopy for Chemical Analysis). The results are shown in Fig.
3. In Fig. 3, vertical axis shows content of elements in the anode 1 and the dielectric
layer 2 and horizontal axis shows sputtering time. The sputtering time is proportional
to a position in thickness direction and sputtering depth per minute of the sputtering
time is about 10 nm.
[0073] As shown in Fig.3, the dielectric layer 2 of the solid electrolytic capacitor A of
Example 1 is composed of niobium oxide whose major component is niobium (Nb) and oxygen
(O). In other words, the dielectric layer 2 contains niobium (Nb) and oxygen (O) and
is composed of niobium oxide whose major component is one element of either of niobium
(Nb) or oxygen (O).
[0074] In the dielectric layer 2, three regions (i), (ii) and (iii) exist in the order from
the face side (the opposite side of the anode).
[0075] The region (i) of the face side of the dielectric layer 2 where the electrolyte
layer 3 is formed is 1 nm thick containing niobium and oxygen and composed of niobium
oxide whose major component is oxygen. Further, in the region (i), about 2.5 atomic
% at the maximum of phosphorus (P) is contained while about 0.5 atomic % or less of
fluorine (F) is contained. As a result, the region (i) is conceivably the second dielectric
layer 22. In the region (i), the phosphorus (P) concentration becomes higher in the
face side and becomes lower toward the anode 1 side.
[0076] The region (ii) is on the inside of the region (i) (the anode 1 side). The region
(ii) is 15 nm thick containing niobium and oxygen and composed of niobium oxide whose
major component is oxygen. The region (iii) is on the inside of the region (ii). The
region (iii) is about 11 nm thick containing niobium and oxygen and composed of niobium
oxide whose major component is niobium.
[0077] Fluorine (F) is contained in both of the region (ii) and the region (iii) while phosphorus
(P) is not contained therein. Therefore, the regions (ii) and (iii) are conceivably
the first dielectric layer 21. In the region (ii), fluorine (F) is contained at almost
uniform concentration of about 0.5 atomic % to depth direction. On the other hand,
in the region (iii), the fluorine concentration is increased from the region (ii)
side toward the anode 1 side. Thus, the fluorine concentration in the first dielectric
layer 21 composed of the regions (ii) and (iii) is increased from the region (i) side
toward the anode 1 side. Further, as the region (iii) contains about 1.8 atomic %
at the maximum of fluorine, the region (iii) conceivably contains niobium fluoride.
Still further, fluorine (F) inside of the anode 1 is conceivably diffused from the
first dielectric layer 21 composed of the regions (ii) and (iii).
[0078] Fig. 4 is a SEM photograph showing the surface of the dielectric layer 2 composed
of the first dielectric layer 21 and the second dielectric layer 22 formed for covering
the circumference of the anode 1 in the solid electrolytic capacitor A of Example
1. Fig. 5 is a SEM photograph showing the surface of the dielectric layer of niobium
oxide composed of the niobium nitride region formed on the anode in the solid electrolytic
capacitor X4 of Comparative Example 4.
[0079] As shown in Fig.4, in the solid electrolytic capacitor A of Example 1, uneven shape
was generated on the surface of the dielectric layer 2. In contrast, as shown in Fig.5,
the surface of the dielectric layer in the solid electrolytic capacitor X4 of Comparative
Example 4 was comparatively flat and smooth. This is believed to be because the aqueous
solution containing ammonium fluoride was used in the step for forming the first dielectric
layer 21 in the solid electrolytic capacitor A of Example 1, the surface of the anode
1 of niobium was dissolved due to fluoride ion in the aqueous solution containing
ammonium fluoride and the uneven shape was generated.
[0080] The resultant solid electrolytic capacitor A of Example 1 and the resultant solid
electrolytic capacitors X1 to X4 of Comparative Examples 1 to 4 were each determined
for leakage current after heat-treatment and equivalent series resistance (ESR) in
high frequency regions.
[0081] In determining for leakage current after heat-treatment, each of the resultant solid
electrolytic capacitor A of Example 1 and the resultant solid electrolytic capacitors
X1 to X4 of Comparative Examples 1 to 4 was heat-treated in a drying furnace of which
temperature was set to about 250 °C in the air for 10 minutes. The set temperature
in the drying furnace measured by a thermocouple attached to vicinity of a sample
holding tool provided in the drying furnace.
[0082] Next, as shown in Fig.6, in each of the resultant solid electrolytic capacitor A
and the resultant solid electrolytic capacitors X1 to X4 after heat-treatment, constant
voltage of about 5 V was applied between the anode lead 1a in the anode 1 and the
cathode 4 and the leakage current after about 20 seconds wasmeasured. Further, each
equivalent series resistance (ESR) between the anode lead 1a and the cathode 4 was
determined by means of LCR meter at about a frequency of 100 kHz.
[0083] Numbers of leakage current and ESR in each of the solid electrolytic capacitors were
determined on a basis of the determined leakage current and ESR in the solid electrolytic
capacitor A of Example 1 defined as 100. The results are shown in Table 1 below.
[0084]
[Table 1]
| |
leakage current |
ESR |
| solid electrolytic capacitor A |
100 |
100 |
| solid electrolytic capacitor X1 |
500 |
100 |
| solid electrolytic capacitor X2 |
1000 |
200 |
| solid electrolytic capacitor X3 |
2000 |
200 |
| solid electrolytic capacitor X4 |
980 |
200 |
[0085] As shown in the table 1, the leakage current of the solid electrolytic capacitor
X1 of Comparative Example 1 was generated about five times as much as that of the
solid electrolytic capacitor A of Example 1. Further, the leakage current of the solid
electrolytic capacitor X2 of Comparative Example 2 was generated about 10 times as
much as that of the solid electrolytic capacitor A of Example 1, the leakage current
of the solid electrolytic capacitor X3 of Comparative Example 3 was generated about
20 times as much as that of the solid electrolytic capacitor A of Example 1 and the
leakage current of the solid electrolytic capacitor X4 of Comparative Example 4 was
generated about 9.8 times as much as that of the solid electrolytic capacitor A of
Example 1. As a result, the leakage current of the solid electrolytic capacitor A
of Example 1 was notably decreased as compared with the solid electrolytic capacitors
X1 to X4 of Comparative Examples 1 to 4.
[0086] Further, ESR in each of the solid electrolytic capacitor A of Example 1 and the solid
electrolytic capacitor X1 of Comparative Example 1 wherein the dielectric layer was
formed by anodize in the aqueous solution containing ammonium fluoride was notably
decreased as compared with ESR in each of the solid electrolytic capacitors X2 to
X4 of Comparative Examples 2 to 4 wherein the dielectric layer anodized in the aqueous
solution containing ammonium fluoride was not formed.
(Example 2)
[0087] In Example 2, a relation between the first aqueous solution used for forming the
first dielectric layer and the leakage current was searched.
[0088] In Example 2, three types of solid electrolytic capacitors B1 to B3 were fabricated
in the same manner as Example 1 except that three types of aqueous solutions, an aqueous
solution containing 0.16 wt% of potassium fluoride, an aqueous solution containing
0.11 wt% of sodium fluoride and an aqueous solution containing 0.05 wt% of fluoric
acid were used as each first aqueous solution instead of the aqueous solution containing
0.5 wt% of ammonium fluoride used as the first aqueous solution in the step of forming
the first dielectric layer 21. The concentration of fluoride ion is about 0.05 wt%
in every aqueous solution of the aforesaid three aqueous solutions. The aforesaid
aqueous solution containing potassium fluoride, the aforesaid aqueous solution containing
sodium fluoride or the aforesaid aqueous solution containing fluoric acid is one of
examples of the first aqueous solution containing fluoride ion.
[0089] As the same manner in Example 1, each of the solid electrolytic capacitors B1 to
B3 was analyzed by ESCA. The result of analyze by ESCA showed that the dielectric
layer 2 wherein the first dielectric layer 21 containing fluorine and the second dielectric
layer 22 containing phosphorus disposed in the order was formed on the anode 1 in
each of the solid electrolytic capacitors B1 to B3.
[0090] Further, leakage current after heat-treatment in each of the solid electrolytic capacitors
B1 to B3 was determined as the same manner in Example 1. Then, a number of the leakage
current of each of the solid electrolytic capacitors B1 to B3 was determined on the
basis of the determined leakage current of the solid electrolytic capacitor A of Example
1 defined as 100. The results are shown in Table 2 below.
[0091]
[Table 2]
| |
leakage current |
| solid electrolytic capacitor B1 |
103 |
| solid electrolytic capacitor B2 |
103 |
| solid electrolytic capacitor B3 |
105 |
| solid electrolytic capacitor A |
100 |
[0092] As shown in the table, as the same as the solid electrolytic capacitor A of Example
1, the leakage current of each of the solid electrolytic capacitors B1 to B3 was notably
decreased as compared with that of the solid electrolytic capacitors X1 to X4 of Comparative
Examples 1 to 4.
[0093] As a result, it was found out that the same results were obtained even if the aqueous
solution containing potassium fluoride, the aqueous solution containing sodium fluoride
or the aqueous solution containing fluoric acid was used as the first aqueous solution
instead of the aqueous solution containing ammonium fluoride. Further, it is believed
to obtain the same results even if other aqueous solutions containing fluoride ion
are used. When comparing among the solid electrolytic capacitors A and B1 to B3, the
solid electrolytic capacitor A of Example 1 using the aqueous solution containing
ammonium fluoride as the first aqueous solution provided the lowest leakage current.
(Example 3)
[0094] In Example 3, a solid electrolytic capacitor C was fabricated in the same manner
as in Example 1 except that an anode of porous sintered body of niobium alloy prepared
by sintering a mixture of niobium and aluminum mixed in a weight ratio of 99:1 was
used instead of the anode 1 of the porous sintered body of niobium.
[0095] As the same manner in Example 1, the solid electrolytic capacitor C was analyzed
by ESCA. The result of analyze by ESCA showed that the dielectric layer 2 wherein
the first dielectric layer 21 containing fluorine and the second dielectric layer
22 containing phosphorus disposed in the order was formed on the anode 1 in the solid
electrolytic capacitor C.
[0096] Further, leakage current after heat-treatment in the solid electrolytic capacitor
C was determined as the same manner in Example 1. Then, the number of leakage current
of the solid electrolytic capacitor C was determined on the basis of the determined
leakage current of the solid electrolytic capacitor A of Example 1 defined as 100.
The results are shown in Table 3 below.
[0097]
[Table 3]
| |
leakage current |
| solid electrolytic capacitor C |
97 |
| solid electrolytic capacitor A |
100 |
[0098] As shown in the table, as the same as the solid electrolytic capacitor A of Example
1, the leakage current of the solid electrolytic capacitor C of Example 3 using the
porous sintered body of niobium alloy as the anode 1 was notably decreased as compared
with the solid electrolytic capacitors X1 to X4 of Comparative Examples 1 to 4. As
a result, it is possible to use niobium alloy, in addition to niobium element, as
the anode material.
(Example 4)
[0099] In Example 4, a solid electrolytic capacitor D was fabricated in the same manner
as in Example 1 except that about 0. 5 wt% of sulfate aqueous solution was used as
the second aqueous solution, instead of about 0.5 wt% of phosphate solution, in the
step of forming the second dielectric layer 22. The aforesaid sulfate aqueous solution
is one of examples of the second aqueous solution containing sulfate ion.
(Comparative Example 5)
[0100] In Comparative Example 5, a solid electrolytic capacitor X5 was fabricated in the
same manner as in Example 1 except that the step of forming the first dielectric layer
21 of Example 1 was omitted and about 0.5 wt% of sulfate aqueous solution used in
Example 4 was used as the second aqueous solution and the time for the anodic oxidation
was changed to about 10 hours in the step of forming the second dielectric layer 22.
In other words, a dielectric layer was composed of only the second dielectric layer
in the solid electrolytic capacitor X5 of Comparative Example 5.
[0101] In the solid electrolytic capacitor D of Example 4, at the stage of forming the dielectric
layer 2 composed of the first dielectric layer 21 and the second dielectric layer
22 for covering the circumference of the anode 1, the dielectric layer 2 was analyzed
by ESCA (Electron Spectroscopy for Chemical Analysis). The results are shown in Fig.
7. In Fig. 7, vertical axis shows content of the elements in the anode 1 and the dielectric
layer 2 and horizontal axis shows sputtering time. The sputtering time is proportional
to the position in the thickness direction and the sputtering depth per minute of
the sputtering time is about 10 nm.
[0102] As shown in Fig.7, the dielectric layer 2 of the solid electrolytic capacitor D of
Example 4 is composed of niobium oxide whose major component is niobium (Nb) and oxygen
(O). In other words, the dielectric layer 2 contains niobium (Nb) and oxygen (O) and
is composed of niobium oxide whose major component is one element of either of niobium
(Nb) or oxygen (O).
[0103] In the dielectric layer 2, three regions (i), (ii) and (iii) exist in the order from
the face side (the opposite side of the anode).
[0104] The region (i) of the face side of the dielectric layer 2 where the electrolyte layer
3 is formed is 1 nm thick containing niobium and oxygen and composed of niobium oxide
whose major component is oxygen. Further, in the region (i), about 2.5 atomic % at
the maximum of sulfur (S) is contained while about 0.5 or less atomic % of fluorine
(F) is contained. As a result, the region (i) is conceivably the second dielectric
layer 22. In the region (i), sulfur (S) concentration becomes higher in the face side
and becomes lower toward the anode 1 side.
[0105] The region (ii) is on inside of the region (i) (the anode 1 side). The region (ii)
is 15 nm thick containing niobium and oxygen and composed of niobium oxide whose major
component is oxygen. The region (iii) is on the inside of the region (ii). The region
(iii) is 11 nm thick containing niobium and oxygen and composed of niobium oxide whose
major component is niobium.
[0106] Fluorine (F) is contained in both of the region (ii) and the region (iii) while sulfur
(S) is not contained therein. Therefore, the regions (ii) and (iii) are conceivably
the first dielectric layer 21. In the region (ii), fluorine (F) is contained at almost
uniform concentration of about 0.5 atomic % to depth direction. On the other hand,
in the region (iii), the fluorine concentration is increased from the region (ii)
side toward the anode 1 side. Thus, the fluorine concentration in the first dielectric
layer 21 composed of the regions (ii) and (iii) is increased from the region (i) side
toward the anode 1 side. Further, as the region (iii) contains about 1.8 atomic %
at the maximum of fluorine, the region (iii) conceivably contains niobium fluoride.
Still further, fluorine (F) inside of the anode 1 is conceivably diffused from the
first dielectric layer 21 composed of the regions (ii) and (iii).
[0107] Next, as the same manner in Example 1, leakage current after heat-treatment and equivalent
series resistance (ESR) at about the frequency of 100 kHz were determined in each
of the solid electrolytic capacitor D of Example 4 and the solid electrolytic capacitor
X5 of Comparative Example 5. Further, the numbers of leakage current and ESR in each
of the solid electrolytic capacitors D and X5 was determined on the basis of the determined
leakage current and ESR in the solid electrolytic capacitor A of Example 1 defined
as 100. The results are shown in Table 4 below.
[0108]
[Table 4]
| |
leakage current |
ESR |
| solid electrolytic capacitor D |
105 |
100 |
| solid electrolytic capacitor X5 |
1200 |
200 |
| solid electrolytic capacitor A |
100 |
100 |
[0109] As shown in the table 4, the leakage current of the solid electrolytic capacitor
X5 of Comparative Example 5 was generated about twelve times as much as that of the
solid electrolytic capacitor A of Example 1. In contrast, as the same as the solid
electrolytic capacitor A of Example 1, the leakage current of the solid electrolytic
capacitor D of Example 4 was notably decreased as compared with the solid electrolytic
capacitors X1 to X5 of Comparative Examples 1 to 5. As a result, it was found out
that in cases where sulfur was contained in the second dielectric layer 22 located
on the face side of the dielectric layer 2 had the effect of decreasing the leakage
current as the same as the solid electrolytic capacitor A of Example 1 wherein phosphorus
was contained in the second dielectric layer 22.
[0110] Further, as the same as the solid electrolytic capacitor A of Example 1, ESR in the
solid electrolytic capacitor D of Example 4 was notably decreased as compared with
ESR in each of the solid electrolytic capacitors X2 to X5 of Comparative Examples
2 to 5 wherein the dielectric layer containing fluorine was not formed.
[0111] In the solid electrolytic capacitor A of Example 1 and the solid electrolytic capacitor
D of Example 4, the first dielectric layer 21 and the second dielectric layer 22 were
composed of the region (iii) of niobium oxide whose major component was niobium and
the regions (i) and (ii) of niobium oxide whose major component was oxygen. It should
be construed, however, that the solid electrolytic capacitor according to the present
invention is not limited to the above description. In the present invention, for example,
the all regions may be composed of niobium oxide whose major component is oxygen or
the region (iii) may be composed of the niobium oxide whose major component is oxygen
and the regions (i) and (ii) maybe composed of niobium oxide whose major component
is niobium.
BRIEF DESCRIPTION OF THE DRAWINGS
[0112]
[Fig.1]
This drawing shows a structural cross-sectional view of a solid electrolytic capacitor
according to an embodiment of the present invention.
[Fig.2]
This drawing shows a structural cross-sectional view of a solid electrolytic capacitor
according to Example 1 of the present invention.
[Fig.3]
This drawing is a graph showing results obtained by the analysis by ESCA of the solid
electrolytic capacitor according to Example 1 of the present invention.
[Fig.4]
This drawing is a SEM photograph showing a surface of a dielectric layer after a second
dielectric layer is formed thereon in Example 1 of the present invention.
[Fig.5]
This drawing is a SEM photograph showing the surface of the dielectric layer after
the second dielectric layer is formed thereon in Comparative Example 2 of the present
invention.
[Fig.6]
This drawing is a typical figure showing a method for determining leakage current
of the solid electrolytic capacitor according to Example 1 of the present invention.
[Fig.7]
This drawing is a graph showing results obtained by the analysis by ESCA of a solid
electrolytic capacitor according to Example 4 of the present invention.
DESCRIPTION OF REFERENCE NUMERALS
[0113]
- 1
- anode
- 1a
- anode lead
- 2
- dielectric layer
- 21
- first dielectric layer
- 22
- second dielectric layer
- 3
- electrolyte layer
- 4
- cathode
- 4a
- first conducting layer
- 4b
- second conducting layer
- 5
- conducting adhesive layer
- 6
- cathode terminal
- 7
- anode terminal
- 8
- mold outer resin
- 100
- solid electrolytic capacitor