(19)
(11) EP 1 714 135 A2

(12)

(88) Date of publication A3:
29.12.2005

(43) Date of publication:
25.10.2006 Bulletin 2006/43

(21) Application number: 05711523.0

(22) Date of filing: 14.01.2005
(51) International Patent Classification (IPC): 
G01N 9/00(2006.01)
(86) International application number:
PCT/US2005/001409
(87) International publication number:
WO 2005/072161 (11.08.2005 Gazette 2005/32)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

(30) Priority: 16.01.2004 US 758825
23.02.2004 US 784750

(71) Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
Danbury, CT 06810 (US)

(72) Inventors:
  • CHEN, Philip, S., H.
    Bethel, Connecticut 06801 (US)
  • CHEN, Ing-Shin
    Danbury, Connecticut 06810 (US)
  • DIMEO, Frank, Jr.
    Danbury, Connecticut 06810 (US)
  • NEUNER, Jeffrey, W.
    Bethel, Connecticut 06801 (US)
  • WELCH, James
    New Fairfield, Connecticut 06812 (US)
  • ROEDER, Jeffrey, F.
    Brookfield, Connecticut 06804 (US)

(74) Representative: Harrison, Robert John et al
Sonnenberg Fortmann Herzogspitalstrasse 10a
80331 München
80331 München (DE)

   


(54) APPARATUS AND PROCESS FOR SENSING TARGET GAS SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS