METHODS FOR MANUFACTURING REFLECTIVE OPTICAL ELEMENTS, REFLECTIVE OPTICAL ELEMENTS, EUV-LITHOGRAPHY APPARATUSES AND METHODS FOR OPERATING OPTICAL ELEMENTS AND EUV-LITHOGRAPHY APPARATUSES, METHODS FOR DETERMINING THE PHASE SHIFT, METHODS FOR DETERMINING THE LAYER THICKNESS, AND APPARATUSES FOR CARRYI

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EP 1 730 597 A2

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(43)	Date of publication:
	13.12.2006 Bulletin 2006/50

(21)	Application number: 05729571.9

(22)	Date of filing: 04.03.2005

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International Patent Classification (IPC):

G03F 7/20^(2006.01)

G01M 11/00^(2006.01)

(86)	International application number:
	PCT/EP2005/050985

(87)	International publication number:
	WO 2005/091076 (29.09.2005 Gazette 2005/39)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR
	Designated Extension States:
	AL BA HR LV MK YU

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Priority:

05.03.2004 DE 102004011355
05.03.2004 US 550302 P
05.03.2004 DE 102004011356

(71)	Applicant: Carl Zeiss SMT AG
	73447 Oberkochen (DE)

(72)	Inventors:
	WEDOWSKI, Marco 73431 Aalen (DE) SCHOLZE, Frank 12524 Berlin (DE) TÜMMLER, Johannes 12524 Berlin (DE)

(74)	Representative: Schultz, Jörg Martin et al
	Carl Zeiss AG Patentabteilung 73446 Oberkochen 73446 Oberkochen (DE)

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METHODS FOR MANUFACTURING REFLECTIVE OPTICAL ELEMENTS, REFLECTIVE OPTICAL ELEMENTS, EUV-LITHOGRAPHY APPARATUSES AND METHODS FOR OPERATING OPTICAL ELEMENTS AND EUV-LITHOGRAPHY APPARATUSES, METHODS FOR DETERMINING THE PHASE SHIFT, METHODS FOR DETERMINING THE LAYER THICKNESS, AND APPARATUSES FOR CARRYI