<?xml version="1.0" encoding="UTF-8"?><!DOCTYPE ep-patent-document PUBLIC "-//EPO//EP PATENT DOCUMENT 1.0//EN" "ep-patent-document-v1-0.dtd"><ep-patent-document id="EP05729571A2" file="05729571.9" lang="en" country="EP" doc-number="1730597" kind="A2" date-publ="20061213" status="n" dtd-version="ep-patent-document-v1-1"><SDOBI lang="en"><B000><eptags><B001EP>ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIROMKCYALTRBGCZEEHUPLSKBAHRISYU........</B001EP><B003EP>*</B003EP><B005EP>X</B005EP><B007EP>DIM360 (Ver 1.5  21 Nov 2005) -  1100000/0</B007EP></eptags></B000><B100><B110>1730597</B110><B130>A2</B130><B140><date>20061213</date></B140><B190>EP</B190></B100><B200><B210>05729571.9</B210><B220><date>20050304</date></B220><B250>en</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>102004011355</B310><B320><date>20040305</date></B320><B330><ctry>DE</ctry></B330><B310>550302 P</B310><B320><date>20040305</date></B320><B330><ctry>US</ctry></B330><B310>102004011356</B310><B320><date>20040305</date></B320><B330><ctry>DE</ctry></B330></B300><B400><B405><date>20061213</date><bnum>200650</bnum></B405><B430><date>20061213</date><bnum>200650</bnum></B430></B400><B500><B510EP><classification-ipcr sequence="1"><text>G03F   7/20        20060101AFI20051006BHEP        </text></classification-ipcr><classification-ipcr sequence="2"><text>G01M  11/00        20060101ALI20051006BHEP        </text></classification-ipcr></B510EP><B540><B541>de</B541><B542>VERFAHREN ZUR HERSTELLUNG REFLEKTIERENDER OPTISCHER ELEMENTE, REFLEKTIERENDE OPTISCHE ELEMENTE, EUV-LITHOGRAPHIEVORRICHTUNGEN UND -VERFAHREN ZUM BETREIBEN VON OPTISCHEN ELEMENTEN UND EUV-LITHOGRAPHIEVORRICHTUNGEN, VERFAHREN ZUR BESTIMMUNG DER PHASENVERSCHIEBUNG, VERFAHREN ZUR BESTIMMUNG DER SCHICHTDICKE UND VORRICHTUNGEN ZUM AUSFÜHREN</B542><B541>en</B541><B542>METHODS FOR MANUFACTURING REFLECTIVE OPTICAL ELEMENTS, REFLECTIVE OPTICAL ELEMENTS, EUV-LITHOGRAPHY APPARATUSES AND METHODS FOR OPERATING OPTICAL ELEMENTS AND EUV-LITHOGRAPHY APPARATUSES, METHODS FOR DETERMINING THE PHASE SHIFT, METHODS FOR DETERMINING THE LAYER THICKNESS, AND APPARATUSES FOR CARRYI</B542><B541>fr</B541><B542>PROCEDES DE FABRICATION D'ELEMENTS OPTIQUES REFLECTEURS, ELEMENTS OPTIQUES REFLECTEURS, APPAREIL DE LITHOGRAVURE AUX UV EXTREMES ET PROCEDES DE MISE EN OEUVRE D'ELEMENTS OPTIQUES ET D'APPAREILS DE LITHOGRAVURE AUX UV EXTREMES, PROCEDES POUR DETERMINER LE DEPHASAGE, PROCEDES POUR DETERMINER L'EPAISSE</B542></B540></B500><B700><B710><B711><snm>Carl Zeiss SMT AG</snm><iid>04288430</iid><irf>05028 P WO</irf><adr><str>Carl-Zeiss-Strasse 22</str><city>73447 Oberkochen</city><ctry>DE</ctry></adr></B711></B710><B720><B721><snm>WEDOWSKI, Marco</snm><adr><str>Otto-Schott-Strasse 15</str><city>73431 Aalen</city><ctry>DE</ctry></adr></B721><B721><snm>SCHOLZE, Frank</snm><adr><str>Rapunzelstrasse 41</str><city>12524 Berlin</city><ctry>DE</ctry></adr></B721><B721><snm>TÜMMLER, Johannes</snm><adr><str>Semmelweisstrasse 15a</str><city>12524 Berlin</city><ctry>DE</ctry></adr></B721></B720><B740><B741><snm>Schultz, Jörg Martin</snm><sfx>et al</sfx><iid>00133421</iid><adr><str>Carl Zeiss AG 
Patentabteilung</str><city>73446 Oberkochen</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>AT</ctry><ctry>BE</ctry><ctry>BG</ctry><ctry>CH</ctry><ctry>CY</ctry><ctry>CZ</ctry><ctry>DE</ctry><ctry>DK</ctry><ctry>EE</ctry><ctry>ES</ctry><ctry>FI</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>GR</ctry><ctry>HU</ctry><ctry>IE</ctry><ctry>IS</ctry><ctry>IT</ctry><ctry>LI</ctry><ctry>LT</ctry><ctry>LU</ctry><ctry>MC</ctry><ctry>NL</ctry><ctry>PL</ctry><ctry>PT</ctry><ctry>RO</ctry><ctry>SE</ctry><ctry>SI</ctry><ctry>SK</ctry><ctry>TR</ctry></B840><B844EP><B845EP><ctry>AL</ctry></B845EP><B845EP><ctry>BA</ctry></B845EP><B845EP><ctry>HR</ctry></B845EP><B845EP><ctry>LV</ctry></B845EP><B845EP><ctry>MK</ctry></B845EP><B845EP><ctry>YU</ctry></B845EP></B844EP><B860><B861><dnum><anum>EP2005050985</anum></dnum><date>20050304</date></B861><B862>en</B862></B860><B870><B871><dnum><pnum>WO2005091076</pnum></dnum><date>20050929</date><bnum>200539</bnum></B871></B870></B800></SDOBI></ep-patent-document>