FIELD OF THE INVENTION
[0001] The present invention relates to a heat-sensitive lithographic printing plate precursor.
BACKGROUND OF THE INVENTION
[0002] Lithographic printing typically involves the use of a so-called printing master such
as a printing plate which is mounted on a cylinder of a rotary printing press. The
master carries a lithographic image on its surface and a print is obtained by applying
ink to said image and then transferring the ink from the master onto a receiver material,
which is typically paper. In conventional lithographic printing, ink as well as an
aqueous fountain solution (also called dampening liquid) are supplied to the lithographic
image which consists of oleophilic (or hydrophobic, i.e. ink-accepting, water-repelling)
areas as well as hydrophilic (or oleophobic, i.e. water-accepting, ink-repelling)
areas. In so-called driographic printing, the lithographic image consists of ink-accepting
and ink-abhesive (ink-repelling) areas and during driographic printing, only ink is
supplied to the master.
[0003] Printing masters are generally obtained by the image-wise exposure and processing
of an imaging material called plate precursor. A typical positive-working plate precursor
comprises a hydrophilic support and an oleophilic coating which is not readily soluble
in an aqueous alkaline developer in the non-exposed state and becomes soluble in the
developer after exposure to radiation. In addition to the well known photosensitive
imaging materials which are suitable for UV contact exposure through a film mask (the
so-called pre-sensitized plates), also heat-sensitive printing plate precursors have
become very popular. Such thermal materials offer the advantage of daylight stability
and are especially used in the so-called computer-to-plate method (CtP) wherein the
plate precursor is directly exposed, i.e. without the use of a film mask. The material
is exposed to heat or to infrared light and the generated heat triggers a (physico-)chemical
process, such as ablation, polymerization, insolubilization by cross-linking of a
polymer or by particle coagulation of a thermoplastic polymer latex, and solubilization
by the destruction of intermolecular interactions or by increasing the penetrability
of a development barrier layer.
[0004] Although some of these thermal processes enable plate making without wet processing,
the most popular thermal plates form an image by a heat-induced solubility difference
in an alkaline developer between exposed and non-exposed areas of the coating. The
coating typically comprises an oleophilic binder, e.g. a phenolic resin, of which
the rate of dissolution in the developer is either reduced (negative working) or increased
(positive working) by the image-wise exposure. During processing, the solubility differential
leads to the removal of the non-image (non-printing) areas of the coating, thereby
revealing the hydrophilic support, while the image (printing) areas of the coating
remain on the support.
[0005] Typically, for a positive-working thermal plate, a dissolution inhibitor is added
to a phenolic resin as binder whereby the rate of dissolution of the coating is reduced.
Upon heating, this reduced rate of dissolution of the coating is increased on the
exposed areas compared with the non-exposed areas, resulting in a sufficient difference
in solubility of the coating after image-wise recording by heat or IR-radiation. Many
different dissolution inhibitors are known and disclosed in the literature, such as
organic compounds having an aromatic group and a hydrogen bonding site or polymers
or surfactants comprising siloxane or fluoroalkyl units.
[0006] The known heat-sensitive printing plate precursors typically comprise a hydrophilic
support and a coating which is alkali-soluble in exposed areas (positive working material)
or in non-exposed areas (negative working material) and an IR-absorbing compound.
Such coating typically comprises an oleophilic polymer which may be a phenolic resin
such as novolac, resol or a polyvinylphenolic resin. The phenolic resin can be chemically
modified whereby the phenolic monomeric unit is substituted by a group such as described
in
WO99/01795,
EP 934 822,
EP 1 072 432,
US 3,929,488,
EP 2 102 443,
EP 2 102 444,
EP 2 102 445,
EP 2 102 446. The phenolic resin can also be mixed with another polymer such as an acidic polyvinyl
acetal as described in
W02004/020484 or a copolymer comprising sulfonamide groups as described in
US 6,143,464. The use of other polymeric binders in lithographic printing plates are described
in
WO2001/09682,
EP 933 682,
WO99/63407,
WO2002/53626,
EP 1 433 594 and
EP 1 439 058.
[0007] EP 731 113 discloses a light sensitive material for a lithographic printing plate. The material
comprises 1,2-quinonediazide and a polymeric binder such as a copolymer comprising
N-methacryloylaminomethyl-phthalimide as monomeric unit.
SUMMARY OF THE INVENTION
[0008] The printing plate precursor of the present invention is positive-working, i.e. after
exposure and development the exposed areas of the oleophilic coating, hereinafter
also referred to as "heat-sensitive coating" or "coating", are removed from the support
and define hydrophilic, non-image (non-printing) areas, whereas the unexposed coating
is not removed from the support and defines an oleophilic image (printing) area. The
polymers of the prior art are not suited for use in the heat-sensitive coating because
an insufficient differentiation in dissolution kinetics between the exposed and non-exposed
areas upon heating was obtained. Therefore, the inventors found a new polymeric binder
for the heat-sensitive coating which is able to exhibit an excellent differentiation
in dissolution kinetics between the exposed and non-exposed areas of the coating and
which has also the advantage of a high chemical resistance of the coating, i.e. the
resistance of the coating against printing liquids such as ink, e.g. UV-inks, fountain
solution, plate and blanket cleaners.
[0009] It is an aspect of the present invention to provide a heat-sensitive lithographic
printing plate precursor as defined in claim 1, having the characteristic feature
the polymer in the heat-sensitive coating of the precursor comprises a first monomeric
unit of formula I

wherein
R
1, R
2 and R
3 are independently a hydrogen atom or an optionally substituted alkyl group,
R
4 and R
5 are independently an optionally substituted alkyl,
cycloalkyl, aryl or arylalkyl group, or wherein R
4 and R
5 together form a cyclic structure.
[0010] Specific embodiments of the invention are defined in the dependent claims.
DETAILED DESCRIPTION OF THE INVENTION
[0011] In accordance with the present invention, there is provided a heat-sensitive lithographic
printing plate precursor comprising a support having a hydrophilic surface or which
is provided with a hydrophilic layer, and a coating which does not dissolve in an
aqueous alkaline developer in the exposed areas and which becomes soluble in an aqueous
alkaline developer in the exposed areas, characterised in that said coating comprises
a polymer having a first monomeric unit of formula I

wherein
R
1, R
2 and R
3 are independently a hydrogen atom or an optionally substituted alkyl group,
R
4 and R
5 are independently an optionally substituted alkyl,
cycloalkyl, aryl or arylalkyl group, or wherein R
4 and R
5 together form a cyclic structure.
In a preferred embodiment, R
4 and R
5 together form a cyclic structure comprising at least 5 carbon atoms. In a still more
preferred embodiment, the first monomeric unit is vinylcaprolactam. The polymer preferably
comprises the first monomeric unit in an amount ranging between 3 and 75 mol%, more
preferably between 4 and 60 mol%, most preferably between 5 and 50 mol%.
[0012] In another embodiment of the present invention, the polymer further comprises a second
monomeric unit of formula II

wherein
R
6, R
7 and R
8 are independently a hydrogen atom or an optionally substituted alkyl group,
R
9 is a hydrogen atom, or an optionally substituted alkyl, cycloalkyl, aryl or arylalkyl
group,
R
10 is represented by formula III or IV:

wherein
* denotes the position of attachment of the group R10 to the nitrogen atom in the above formula II,
X is -C(=O)- or -SO2-,
R11 and R12 are independently an optionally substituted alkyl, alkenyl, cycloalkyl, aryl, arylalkyl
or heteroaryl group, or wherein R11 and R12 together form a cyclic structure,
R13 and R14 are independently a hydrogen atom, or an optionally substituted alkyl, alkenyl, cycloalkyl,
aryl, arylalkyl or heteroaryl group, or wherein R13 and R14 together form a cyclic structure.
In a preferred embodiment, R10 has the structure of formula V:


wherein
* denotes the position of attachment of the group R10 to the nitrogen atom in the above formula II,
n is 0, 1, 2, 3 or 4,
each R
a is independently selected from hydrogen, halogen, -CN, -NO
2, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic,aryl,
heteroaryl, aralkyl or heteroaralkyl group, -OR
b, -S-R
c, -SO
3-R
d, -CO-O-R
e, -O-CO-R
f, -NR
gR
h, -NRi-CO-Rj, -NR
k-SO
2-R
l, -CO-R
m, -CO-NR
nR
o, -SO
2-NR
pR
q or -P(=O) (-O-R
r) (-O-R
s),
wherein R
b to R
s are independently selected from hydrogen or an optionally substituted alkyl or aryl
group.
The second monomeric unit is preferably N-acryloylaminomethyl-phthalimide or N-methacryloylaminomethyl-phthalimide.
The polymer preferably comprises the second monomeric unit in an amount ranging between
5 and 95 mol%, more preferably between 10 and 85 mol%, most preferably between 20
and 75 mol%.
[0013] In another embodiment of the present invention, the polymer further comprises a third
monomeric unit of formula VI:

wherein
R
15, R
16 and R
17 are independently a hydrogen atom or an optionally substituted alkyl group,
R
18 is a hydrogen atom, a positive charged metal ion or ammonium ion, or an optionally
substituted alkyl, cycloalkyl, aryl or arylalkyl group.
In a preferred embodiment, the third monomeric unit is (meth)acrylic acid or salts
or alkyl esters thereof.
The polymer preferably comprises the third monomeric unit in an amount ranging between
2 and 70 mol%, more preferably between 4 and 60 mol%, most preferably between 6 and
50 mol%.
[0014] In another preferred embodiment of the present invention, the polymer comprises a
combination of a first monomeric unit of formula I, a second monomeric unit of formula
II and a third monomeric unit of formula VI. The polymer preferably comprises these
three monomeric units in an amount ranging between 5 and 50 mol% for the first monomeric
unit, between 20 and 75 mol% for the second monomeric unit and between 3 and 40 mol%
for the third monomeric unit. In a more preferred embodiment of the present invention,
the polymer comprises a combination of N-vinylcaprolactam, N-(meth)acryloylaminomethyl-phthalimide
and (meth)acrylic acid. The polymer preferably comprises N-vinylcaprolactam in the
in an amount ranging between 5 and 50 mol%, more preferably between 10 and 40 mol%,
N-(meth)acryloylamino methyl-phthalimide between 20 and 75 mol%, more preferably between
30 and 70 mol%, (meth)acrylic acid between 3 and 35 mol%, more preferably between
5 and 30 mol%.
[0015] Other polymers such as phenolic resins, novolac, resoles, polyvinyl phenol or carboxy-substituted
polymers can be added to the heat-sensitive coating. Examples of such polymers are
described in
DE-A-4007428,
DE-A-4027301 and
DE-A-4445820. Also phenolic resin wherein the phenyl group or the hydroxy group of the phenolic
monomeric unit are chemically modified with an organic substituent as described in
EP 894 622,
EP 901 902,
EP 933 682,
WO99/63407,
EP 934 822,
EP 1 072 432,
US 5,641,608,
EP 982 123,
WO99/01795,
WO04/035310,
WO04/035686,
WO04/035645,
WO04/035687 or
EP 1 506 858 can be added to the heat-sensitive coating.
[0016] In a preferred positive-working lithographic printing plate precursor, the coating
also contains one or more dissolution inhibitors. Dissolution inhibitors are compounds
which reduce the dissolution rate of the hydrophobic polymer in the aqueous alkaline
developer at the non-exposed areas of the coating and wherein this reduction of the
dissolution rate is diminished by the heat generated during the exposure so that the
coating readily dissolves in the developer at exposed areas. Thereby, the dissolution
inhibitor provides a wide differentiation in dissolution rate between the exposed
and non-exposed areas. By preference, the coating has a good development latitude,
i.e. the exposed coating areas have dissolved completely in the developer before the
non-exposed areas are attacked by the developer to such an extent that the ink-accepting
capability of the coating is affected. The dissolution inhibitor(s) can be added to
the layer which comprises the hydrophobic polymer discussed above.
[0017] The dissolution rate of the non-exposed coating in the developer is preferably reduced
by interaction between the hydrophobic polymer and the inhibitor, due to e.g. hydrogen
bonding between these compounds. Suitable dissolution inhibitors are preferably organic
compounds which comprise at least one aromatic group and a hydrogen bonding site,
e.g. a carbonyl group, a sulfonyl group, or a nitrogen atom which may be quaternized
and which may be part of a heterocyclic ring or which may be part of an amino substituent
of said organic compound. Suitable dissolution inhibitors of this type have been disclosed
in e.g.
EP-A 825 927 and
823 327.
[0018] Water-repellent polymers represent an another type of suitable dissolution inhibitors.
Such polymers seem to increase the developer resistance of the coating by repelling
the aqueous developer from the coating. The water-repellent polymers can be added
to the layer comprising the hydrophobic polymer and/or can be present in a separate
layer provided on top of the layer with the hydrophobic polymer. In the latter embodiment,
the water-repellent polymer forms a barrier layer which shields the coating from the
developer and the solubility of the barrier layer in the developer or the penetrability
of the barrier layer by the developer can be increased by exposure to heat or infrared
light, as described in e.g.
EP-A 864420,
EP-A 950 517 and
WO99/21725. Preferred examples of the water-repellent polymers are polymers comprising siloxane
and/or perfluoroalkyl units. In one embodiment, the coating contains such a water-repellent
polymer in an amount between 0.5 and 25 mg/m
2, preferably between 0.5 and 15 mg/m
2 and most preferably between 0.5 and 10 mg/m
2. When the water-repellent polymer is also ink-repelling, e.g. in the case of polysiloxanes,
higher amounts than 25 mg/m
2 can result in poor ink-acceptance of the non-exposed areas. An amount lower than
0.5 mg/m
2 on the other hand may lead to an unsatisfactory development resistance. The polysiloxane
may be a linear, cyclic or complex cross-linked polymer or copolymer. The term polysiloxane
compound shall include any compound which contains more than one siloxane group -Si(R,R')-O-,
wherein R and R' are optionally substituted alkyl or aryl groups. Preferred siloxanes
are phenylalkylsiloxanes and dialkylsiloxanes. The number of siloxane groups in the
(co)polymer is at least 2, preferably at least 10, more preferably at least 20. It
may be less than 100, preferably less than 60. In another embodiment, the water-repellent
polymer is a block-copolymer or a graft-copolymer of a poly(alkylene oxide) block
and a block of a polymer comprising siloxane and/or perfluoroalkyl units. A suitable
copolymer comprises about 15 to 25 siloxane units and 50 to 70 alkylene oxide groups.
Preferred examples include copolymers comprising phenylmethylsiloxane and/or dimethylsiloxane
as well as ethylene oxide and/or propylene oxide, such as Tego Glide 410, Tego Wet
265, Tego Protect 5001 or Silikophen P50/X, all commercially available from Tego Chemie,
Essen, Germany. Such a copolymer acts as a surfactant which upon coating, due to its
bifunctional structure, automatically positions itself at the interface between the
coating and air and thereby forms a separate top layer even when the whole coating
is applied from a single coating solution. Simultaneously, such surfactants act as
a spreading agent which improves the coating quality. Alternatively, the water-repellent
polymer can be applied in a second solution, coated on top of the layer comprising
the hydrophobic polymer. In that embodiment, it may be advantageous to use a solvent
in the second coating solution that is not capable of dissolving the ingredients present
in the first layer so that a highly concentrated water-repellent phase is obtained
at the top of the coating.
[0019] Preferably, also one or more development accelerators are included in the coating,
i.e. compounds which act as dissolution promoters because they are capable of increasing
the dissolution rate of the non-exposed coating in the developer. The simultaneous
application of dissolution inhibitors and accelerators allows a precise fine tuning
of the dissolution behavior of the coating. Suitable dissolution accelerators are
cyclic acid anhydrides, phenols or organic acids. Examples of the cyclic acid anhydride
include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride,
tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, alpha -phenylmaleic
anhydride, succinic anhydride, and pyromellitic anhydride, as described in
U.S. Patent No. 4,115,128. Examples of the phenols include bisphenol A, p-nitrophenol, p-ethoxyphenol, 2,4,4'-trihydroxybenzophenone,
2,3,4-trihydroxy-benzophenone, 4-hydroxybenzophenone, 4,4',4"-trihydroxy-triphenylmethane,
and 4,4',3",4"-tetrahydroxy-3,5,3',5'-tetramethyltriphenyl-methane, and the like.
Examples of the organic acids include sulfonic acids, sulfinic acids, alkylsulfuric
acids, phosphonic acids, phosphates, and carboxylic acids, as described in, for example,
JP-A Nos. 60-88,942 and 2-96,755. Specific examples of these organic acids include p-toluenesulfonic
acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, ethylsulfuric acid, phenylphosphonic
acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic
acid, adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic
acid, 4-cyclohexene-1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic
acid, and ascorbic acid. The amount of the cyclic acid anhydride, phenol, or organic
acid contained in the coating is preferably in the range of 0.05 to 20% by weight,
relative to the coating as a whole.
[0020] The support has a hydrophilic surface or is provided with a hydrophilic layer. The
support may be a sheet-like material such as a plate or it may be a cylindrical element
such as a sleeve which can be slid around a print cylinder of a printing press. Preferably,
the support is a metal support such as aluminum or stainless steel.
[0021] A particularly preferred lithographic support is an electrochemically grained and
anodized aluminum support.
[0022] Graining and anodizing of aluminum lithographic supports is well known. The grained
aluminum support used in the material of the present invention is preferably an electrochemically
grained support. The acid used for graining can be e.g. nitric acid. The acid used
for graining preferably comprises hydrogen chloride. Also mixtures of e.g. hydrogen
chloride and acetic acid can be used.
[0023] The grained and anodized aluminum support may be post-treated to improve the hydrophilic
properties of its surface. For example, the aluminum support may be silicated by treating
its surface with a sodium silicate solution at elevated temperature, e.g. 95°C. Alternatively,
a phosphate treatment may be applied which involves treating the aluminum oxide surface
with a phosphate solution that may further contain an inorganic fluoride. Further,
the aluminum oxide surface may be rinsed with an organic acid and/or salt thereof,
e.g. carboxylic acids, hydroxycarboxylic acids, sulfonic acids or phosphonic acids,
or their salts, e.g. succinates, phosphates, phosphonates, sulfates, and sulfonates.
A citric acid or citrate solution is preferred. This treatment may be carried out
at room temperature or may be carried out at a slightly elevated temperature of about
30 to 50°C. A further post-treatment involves rinsing the aluminum oxide surface with
a bicarbonate solution. Still further, the aluminum oxide surface may be treated with
polyvinylphosphonic acid, polyvinylmethylphosphonic acid, phosphoric acid esters of
polyvinyl alcohol, polyvinylsulfonic acid, polyvinylbenzenesulfonic acid, sulfuric
acid esters of polyvinyl alcohol, and acetals of polyvinyl alcohols formed by reaction
with a sulfonated aliphatic aldehyde. It is further evident that one or more of these
post-treatments may be carried out alone or in combination. More detailed descriptions
of these treatments are given in
GB-A- 1 084 070,
DE-A- 4 423 140,
DE-A- 4 417 907,
EP-A- 659 909,
EP-A- 537 633,
DE-A- 4 001 466,
EP-A- 292 801,
EP-A- 291 760 and
US-P- 4 458 005.
[0024] According to another embodiment, the support can also be a flexible support, which
is provided with a hydrophilic layer, hereinafter called 'base layer'. The flexible
support is e.g. paper, plastic film, thin aluminum or a laminate thereof. Preferred
examples of plastic film are polyethylene terephthalate film, polyethylene naphthalate
film, cellulose acetate film, polystyrene film, polycarbonate film, etc. The plastic
film support may be opaque or transparent.
[0025] The base layer is preferably a cross-linked hydrophilic layer obtained from a hydrophilic
binder cross-linked with a hardening agent such as formaldehyde, glyoxal, polyisocyanate
or a hydrolyzed tetra-alkylorthosilicate. The latter is particularly preferred. The
thickness of the hydrophilic base layer may vary in the range of 0.2 to 25 µm and
is preferably 1 to 10 µm.
[0026] The hydrophilic binder for use in the base layer is e.g. a hydrophilic (co)polymer
such as homopolymers and copolymers of vinyl alcohol, acrylamide, methylol acrylamide,
methylol methacrylamide, acrylic acid, methacrylic acid, hydroxyethyl acrylate, hydroxyethyl
methacrylate or maleic anhydride/vinylmethylether copolymers. The hydrophilicity of
the (co)polymer or (co)polymer mixture used is preferably the same as or higher than
the hydrophilicity of polyvinyl acetate hydrolyzed to at least an extent of 60% by
weight, preferably 80% by weight.
[0027] The amount of hardening agent, in particular tetraalkyl orthosilicate, is preferably
at least 0.2 parts per part by weight of hydrophilic binder, more preferably between
0.5 and 5 parts by weight, most preferably between 1 parts and 3 parts by weight.
[0028] The hydrophilic base layer may also contain substances that increase the mechanical
strength and the porosity of the layer. For this purpose colloidal silica may be used.
The colloidal silica employed may be in the form of any commercially available water
dispersion of colloidal silica for example having an average particle size up to 40
nm, e.g. 20 nm. In addition inert particles of larger size than the colloidal silica
may be added e.g. silica prepared according to Stöber as described in
J. Colloid and Interface Sci., Vol. 26, 1968, pages 62 to 69 or alumina particles or particles having an average diameter of at least 100 nm which
are particles of titanium dioxide or other heavy metal oxides. By incorporating these
particles the surface of the hydrophilic base layer is given a uniform rough texture
consisting of microscopic hills and valleys, which serve as storage places for water
in background areas.
[0030] It is particularly preferred to use a film support to which an adhesion improving
layer, also called support layer, has been provided. Particularly suitable adhesion
improving layers for use in accordance with the present invention comprise a hydrophilic
binder and colloidal silica as disclosed in
EP-A- 619 524,
EP-A- 620 502 and
EP-A- 619 525. Preferably, the amount of silica in the adhesion improving layer is between 200
mg/m
2 and 750 mg/m
2. Further, the ratio of silica to hydrophilic binder is preferably more than 1 and
the surface area of the colloidal silica is preferably at least 300 m
2/gram, more preferably at least 500 m
2/ gram.
[0031] The coating provided on the support is heat-sensitive and can preferably be handled
in normal working lighting conditions (daylight, fluorescent light) for several hours.
The coating preferably does not contain UV-sensitive compounds which have an absorption
maximum in the wavelength range of 200 nm to 400 nm such as diazo compounds, photoacids,
photoinitiators, quinone diazides, or sensitizers. Preferably the coating neither
contains compounds which have an absorption maximum in the blue and green visible
light wavelength range between 400 and 600 nm.
[0032] According to a preferred embodiment, the material of the present invention is image-wise
exposed to infrared light, which is converted into heat by an infrared light absorbing
agent, which may be a dye or pigment having an absorption maximum in the infrared
wavelength range. The concentration of the sensitizing dye or pigment in the coating
is typically between 0.25 and 10.0 wt.%, more preferably between 0.5 and 7.5 wt.%
relative to the coating as a whole. Preferred IR-absorbing compounds are dyes such
as cyanine or merocyanine dyes or pigments such as carbon black. A suitable compound
is the following infrared dye :

wherein X
- is a suitable counter ion such as tosylate.
[0033] The coating may further contain an organic dye which absorbs visible light so that
a perceptible image is obtained upon image-wise exposure and subsequent development.
Such a dye is often called contrast dye or indicator dye. Preferably, the dye has
a blue color and an absorption maximum in the wavelength range between 600nm and 750
nm. Although the dye absorbs visible light, it preferably does not sensitize the printing
plate precursor, i.e. the coating does not become more soluble in the developer upon
exposure to visible light. Suitable examples of such a contrast dye are the quaternized
triarylmethane dyes. Another suitable compound is the following dye:

[0034] The infrared light absorbing compound and the contrast dye may be present in the
layer comprising the hydrophobic polymer, and/or in the barrier layer discussed above
and/or in an optional other layer. According to a highly preferred embodiment, the
infrared light absorbing compound is concentrated in or near the barrier layer, e.g.
in an intermediate layer between the layer comprising the hydrophobic polymer and
the barrier layer.
[0035] The printing plate precursor of the present invention can be exposed to infrared
light with LEDs or a laser. Preferably, a laser emitting near infrared light having
a wavelength in the range from about 750 to about 1500 nm is used, such as a semiconductor
laser diode, a Nd:YAG or a Nd:YLF laser. The required laser power depends on the sensitivity
of the image-recording layer, the pixel dwell time of the laser beam, which is determined
by the spot diameter (typical value of modern plate-setters at 1/e
2 of maximum intensity : 10-25 µm), the scan speed and the resolution of the exposure
apparatus (i.e. the number of addressable pixels per unit of linear distance, often
expressed in dots per inch or dpi; typical value : 1000-4000 dpi).
[0036] Two types of laser-exposure apparatuses are commonly used: internal (ITD) and external
drum (XTD) plate-setters. ITD plate-setters for thermal plates are typically characterized
by a very high scan speed up to 1500 m/sec and may require a laser power of several
Watts. The Agfa Galileo T is a typical example of a plate-setter using the ITD-technology.
XTD plate-setters operate at a lower scan speed typically from 0.1 m/sec to 10 m/sec
and have a typical laser-output-power per beam from 20 mW up to 500 mW. The Creo Trendsetter
plate-setter family and the Agfa Excalibur plate-setter family both make use of the
XTD-technology.
[0037] The known plate-setters can be used as an off-press exposure apparatus, which offers
the benefit of reduced press down-time. XTD plate-setter configurations can also be
used for on-press exposure, offering the benefit of immediate registration in a multi-color
press. More technical details of on-press exposure apparatuses are described in e.g.
US 5,174,205 and
US 5,163,368.
[0038] In the development step, the non-image areas of the coating can be removed by immersion
in an aqueous alkaline developer, which may be combined with mechanical rubbing, e.g.
by a rotating brush. The developer preferably has a pH above 10, more preferably above
12. The development step may be followed by a rinsing step, a gumming step, a drying
step and/or a post-baking step.
[0039] The printing plate thus obtained can be used for conventional, so-called wet offset
printing, in which ink and an aqueous dampening liquid is supplied to the plate. Another
suitable printing method uses so-called single-fluid ink without a dampening liquid.
Single-fluid ink consists of an ink phase, also called the hydrophobic or oleophilic
phase, and a polar phase which replaces the aqueous dampening liquid that is used
in conventional wet offset printing. Suitable examples of single-fluid inks have been
described in
US 4,045,232;
US 4,981,517 and
US 6,140,392. In a most preferred embodiment, the single-fluid ink comprises an ink phase and
a polyol phase as described in
WO 00/32705.
EXAMPLES
Preparation of the lithographic substrate:
[0040] A 0.30 mm thick aluminum foil was degreased by immersing the foil in an aqueous solution
containing 40 g/l of sodium hydroxide at 60°C for 8 seconds and rinsed with demineralized
water for 2 seconds. The foil was then electrochemically grained during 15 seconds
using an alternating current in an aqueous solution containing 12 g/l of hydrochloric
acid and 38 g/l of aluminum sulfate (18-hydrate) at a temperature of 33°C and a current
density of 130 A/dm
2. After rinsing with demineralized water for 2 seconds, the aluminum foil was then
desmutted by etching with an aqueous solution containing 155 g/l of sulfuric acid
at 70°C for 4 seconds and rinsed with demineralized water at 25°C for 2 seconds. The
foil was subsequently subjected to anodic oxidation during 13 seconds in an aqueous
solution containing 155 g/l of sulfuric acid at a temperature of 45°C and a current
density of 22 A/dm
2, then washed with demineralized water for 2 seconds and post-treated for 10 seconds
with a solution containing 4 g/l of polyvinylphosphonic acid at 40°C, rinsed with
demineralized water at 20°C during 2 seconds and dried.
[0041] The support thus obtained was characterized by a surface roughness Ra of 0.50 µm
and an anodic weight of 2.9 g/m
2 of Al
2O
3.
Monomer-01 has the following structure:
[0042]

Monomer-02 has the following structure:
[0043]

Synthesis of Polymer-01:
[0044] Polymer-01 is a copolymer of N-vinylcaprolactam, Monomer-01 and methacrylic acid
in a molar ratio of 33/57/10. Polymer-01 is prepared by the following method:
9.48 g (0.0681 mol) of N-vinylcaprolactam, 28.74 g (0.118 mol) of Monomer-01 and 1.78
g (0.0206 mol) of methacrylic acid were added to a closed reaction vessel fitted with
a water-cooled condenser, thermometer, nitrogen inlet and mechanical stirrer, containing
129.6 g of γ-butyrolactone. The obtained mixture was stirred under heating at 90°C
till it became a clear solution.
1.52 g of azo-initator dimethyl-2,2'-azobisisobutyrate (V601 supplied by Wako Pure
Chemical Industries, Ltd) was dissolved in 28.9 g of γ-butyrolactone. The obtained
solution was added dropwise to the reaction mixture for 30 minutes. After this the
reaction was continued at 90°C for additional 7 hours. After completion of the reaction,
the temperature was adjusted to room-temperature. The resulting polymer solution has
a concentration of approximately 20%.
Synthesis of Polymer-02:
[0045] Polymer-02 is a copolymer of Monomer-01 and Monomer-02 in a molar ratio of 57/43.
Polymer-02 is prepared by the following method:
23.33 g (0.096 mol) of Monomer-01 and 12.84 g (0.072 mol) of Monomer-02 were added
to a closed reaction vessel fitted with a water-cooled condenser, thermometer, nitrogen
inlet and mechanical stirrer, containing 116.35 g of γ-butyrolactone. The obtained
mixture was stirred under heating at 90°C till it became a clear solution. 1.37 g
of azo-initiator dimethyl-2,2'-azobisisobutyrate (V601 supplied by Wako Pure Chemical
Industries, Ltd) was dissolved in 26.1 g of γ-butyrolactone. The obtained solution
was added dropwise to the reaction mixture for 30 minutes. After this the reaction
was continued at 90°C for additional 7 hours. After completion of the reaction, the
temperature was adjusted to room-temperature. The resulting polymer solution has a
concentration of approximately 20%.
Synthesis of Polymer-03:
[0046] Polymer-03 is a copolymer of N-vinylcaprolactam, Monomer-01, Monomer-02 and methacrylic
acid in a molar ratio of 9/57/19/15. Polymer-03 is prepared by the following method:
3.16 g (0.0227 mol) of N-vinylcaprolactam, 35.07 g (0.1436 mol) of Monomer-01, 8.53
g (0.0479 mol) of Monomer-02 and 3.25 g (0.0378 mol) of methacrylic acid were added
to a closed reaction vessel fitted with a water-cooled condenser, thermometer, nitrogen
inlet and mechanical stirrer, containing 162 g of γ-butyrolactone. The obtained mixture
was stirred under heating at 90°C till it became a clear solution.
1.9 g of azo-initiator dimethyl-2,2'-azobisisobutyrate (V601 supplied by Wako Pure
Chemical Industries, Ltd) was dissolved in 36.1 g of γ-butyrolactone. The obtained
solution was added dropwise to the reaction mixture for 30 minutes. After this the
reaction was continued at 90°C for additional 7 hours. After completion of the reaction,
the temperature was adjusted to room-temperature. The resulting polymer solution has
a concentration of approximately 20%.
Preparation of the printing plate precursors PPP-01 to PPP-03:
[0047] The printing plate precursors PPP-01 to PPP-03 were produced by applying the coating
defined in Table 1 onto the above described lithographic support. The solvent used
to apply the coating is a mixture of 50% methylethyl ketone (MEK) / 50% Dowanol PM
(1-methoxy-2-propanol from Dow Chemical Company). The coating was applied at a wet
coating thickness of 26 µm and then dried at 135°C. The dry coating weight was 1.28
g/m
2.
Table 1: Composition of the coating (g/m
2)
INGREDIENTS |
PPP-01 (g/m2) |
PPP-02 (g/m2) |
PPP-03 (g/m2) |
Polymer-01 |
1.080 |
|
|
Polymer-02 |
|
1.080 |
|
Alnovol SP452 (1) |
|
|
1.080 |
3,4,5-trimethoxy cinnamic acid |
0.1395 |
0.1395 |
0.1395 |
SOO94 IR-1 (2) |
0.0550 |
0.0550 |
0.0550 |
Basonyl blue 640 (3) |
0.0138 |
0.0138 |
0.0138 |
Tegoglide 410 (4) |
0.0055 |
0.0055 |
0.0055 |
Tegowet 265 (5) |
0.0022 |
0.0022 |
0.0022 |
Dry thickness (g/m2) |
1.28 |
1.28 |
1.28 |
(1) Alnovol SPN452 is a 40.5 weight % solution of novolac in Dowanol PM, commercially
available from Clariant
(2) SOO94 is an IR absorbing cyanine dye, commercially available from FEW CHEMICALS;
the chemical structure of SOO94 is equal to IR-1

(3) Basonyl blue 640 is a quaternised triaryl methane dye, commercially available
from BASF
(4) Tegoglide 410 is a copolymer of polysiloxane and polyalkylene oxide, commercially
available from Tego Chemie Service GmbH
(5) Tegowet 265 is a copolymer of polysiloxane and polyalkylene oxide, commercially
available from Tego Chemie Service GmbH
Chemical resistance
[0048] For measuring the chemical resistance 3 different solutions were selected:
- Test solution 1: solution of isopropanol in a concentration of 50 % by weight in water,
- Test solution 2: EMERALD PREMIUM MXEH, commercially available from ANCHOR,
- Test solution 3: ANCHOR AQUA AYDE, commercially available from ANCHOR.
[0049] The chemical resistance was tested by contacting a droplet of 40µl of a test solution
on different spots of the coating. After 3 minutes, the droplet was removed from the
coating with a cotton pad. The attack on the coating due to each test solution was
rated by visual inspection as follows:
0: no attack,
1: changed gloss of the coating's surface,
2: small attack of the coating (thickness is decreased),
3: heavy attack of the coating,
4: completely dissolved coating.
The higher the rating, the less is the chemical resistance of the coating. The results
for the test solutions on each printing plate precursor are summarized in Table 2.
Table 2: Test results for the chemical resistance
EXAMPLES number |
Type PPP |
Test solution 1 |
Test solution 2 |
Test solution 3 |
Invention Example 1 |
PPP-01 |
2 |
2 |
1 |
Comparative Example 1 |
PPP-02 |
1 |
2 |
1 |
Comparative Example 2 |
PPP-03 |
3 |
4 |
3 |
[0050] The test results of Table 2 demonstrate that the precursor PPP-01 show an improved
chemical resistance compared with novolac in the PPP-03. The chemical resistance of
precursor PPP-02 is also improved but the differentiation between the exposed and
non-exposed areas is insufficient as indicated below.
Image-wise exposure and developing
[0051] The printing plate precursors were exposed with a Creo Trendsetter 3244 (plate-setter,
trademark from Creo, Burnaby, Canada), operating at 150 rpm and varying energy densities
up to 200 mJ/cm
2 and processed at 25°C with the Agfa TD6000A developer, commercially available from
Agfa-Gevaert.
[0052] The printing plate, obtained from PPP-01, exhibits a good differentiation between
the exposed and non-exposed areas whereby the exposed areas are removed by the developer
while the non-exposed areas are substantially not affected by the developer solution
(positive-working printing plates). In the printing plate, obtained from PPP-02, the
coating is only partially removed in the exposed areas, resulting in an insufficient
differentiation between the exposed and non-exposed areas.
Preparation of the printing plate precursor PPP-04:
[0053] The printing plate precursor PPP-04 was produced by applying the coating defined
in Table 3 onto the above described lithographic support. The solvent used to apply
the coating is a mixture of 50% methylethyl ketone (MEK) / 50% Dowanol PM (1-methoxy-2-propanol
from Dow Chemical Company). The coating was applied at a wet coating thickness of
16 µm and then dried at 135°C. The dry coating weight was 0.72 g/m
2.
Table 3: Composition of the coating (g/m
2)
INGREDIENTS |
PPP-04 (g/m2) |
Polymer-03 |
0.6327 |
3,4,5-trimethoxy cinnamic acid |
0.0409 |
SOO94 IR-1 (2) |
0.0323 |
Basonyl blue 640 (3) |
0.0081 |
Tegoglide 410 (4) |
0.0013 |
Tegowet 265 (5) |
0.0032 |
Dry thickness (g/m2) |
0.72 |
Chemical resistance
[0054] The chemical resistance was determined in an analogous way as described above. The
test results are summarized in Table 4.
Table 4: Test results for the chemical resistance
EXAMPLE number |
Type PPP |
Test solution 1 |
Test solution 2 |
Test solution 3 |
Invention Example 2 |
PPP-04 |
0 |
1 |
0 |
[0055] The test results of Table 4 demonstrate that the precursor PPP-04 shows a high chemical
resistance.
Image-wise exposure and developing
[0056] The printing plate precursor PPP-04 was exposed and processed as described above.
The printing plate, obtained from PPP-04, exhibit a good differentiation between the
exposed and non-exposed areas whereby the exposed areas are removed by the developer
while the non-exposed areas are substantially not affected by the developer solution
(positive-working printing plates).
1. A positive-working heat-sensitive lithographic printing plate precursor comprising
- a support having a hydrophilic surface or which is provided with a hydrophilic layer,
and
- a coating which does not dissolve in an aqueous alkaline developer in the unexposed
areas and which becomes soluble in an aqueous alkaline developer in the exposed areas,
characterised in that said coating comprises a polymer having a first monomeric unit of formula I

wherein
R
1, R
2 and R
3 are independently a hydrogen atom or an optionally substituted alkyl group,
R
4 and R
5 are independently an optionally substituted alkyl, cycloalkyl, aryl or arylalkyl
group, or wherein R
4 and R
5 together form a cyclic structure.
2. A precursor according to claim 1, wherein R4 and R5 together form a cyclic structure comprising at least 5 carbon atoms.
3. A precursor according to any of the preceding claims, wherein said first monomeric
unit is vinylcaprolactam.
4. A precursor according to any of the preceding claims, wherein said polymer comprises
said first monomeric unit in an amount between 3 mol% and 75 mol%.
5. A precursor according to any of the preceding claims, wherein said polymer further
comprises a second monomeric unit of formula II:

wherein
R
6, R
7 and R
8 are independently a hydrogen atom or an optionally substituted alkyl group,
R
9 is a hydrogen atom, or an optionally substituted alkyl, cycloalkyl, aryl or arylalkyl
group,
R
10 is represented by formula III or IV:

wherein
* denotes the position of attachment of the group R10 to the nitrogen atom in formula II,
X is -C(=O)- or -SO
2-,
R
11 and R
12 are independently an optionally substituted alkyl, alkenyl, cycloalkyl, aryl, arylalkyl
or heteroaryl group, or wherein R
11 and R
12 together form a cyclic structure,
R
13 and R
14 are independently a hydrogen atom, or an optionally substituted alkyl, alkenyl, cycloalkyl,
aryl, arylalkyl or heteroaryl group, or wherein R
13 and R
14 together form a cyclic structure.
6. A precursor according to claim 5, wherein R
10 is represented by formula V:

wherein
* denotes the position of attachment of the group R10 to the nitrogen atom in formula II,
n is 0, 1, 2, 3 or 4,
each R
a is independently selected from hydrogen, halogen, -CN, - NO
2, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic,aryl,
heteroaryl, aralkyl or heteroaralkyl group, -O-R
b, -S-R
c, -SO
3-R
d, -CO-O-R
e, -O-CO-R
f, - NR
gR
h, -NRi-CO-Rj, -NR
k-SO
2-R
1, -CO-R
m, -CO-NR
nR
o, -SO
2-NR
pR
q or -P(=O) (-O-R
r) (-O-R
s), wherein R
b to R
s are independently selected from hydrogen or an optionally substituted alkyl or aryl
group.
7. A precursor according to claim 5 or 6, wherein said polymer comprises said second
monomeric unit in an amount between 5 mol% and 95 mol%.
8. A precursor according to any of the preceding claims, wherein said polymer further
comprises a third monomeric unit of formula VI:

wherein
R
15, R
16 and R
17 are independently a hydrogen atom or an optionally substituted alkyl group,
R
18 is a hydrogen atom, a positive charged metal ion or ammonium ion, or an optionally
substituted alkyl, cycloalkyl, aryl or arylalkyl group.
9. A precursor according to claim 8, wherein said polymer comprises said third monomeric
unit in an amount between 2 mol% and 70 mol%.
10. Method of making a positive-working heat-sensitive lithographic printing plate comprising
the steps of
- (i) providing a positive-working lithographic printing plate precursor as defined
in claim 1,
- (ii) image-wise exposing the precursor to IR-radiation or heat, and
- (iii) developing the image-wise exposed precursor with an aqueous alkaline developing
solution thereby removing the coating on the exposed areas while essentially not affecting
the coating in the non-exposed areas by the developer.